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A continuous discharge improves the performance of the Cu/CuCl double pulse laser

Kushner, M. J. and Culick, F. E. C. (1979) A continuous discharge improves the performance of the Cu/CuCl double pulse laser. IEEE Journal of Quantum Electronics, 15 (9). pp. 835-837. ISSN 0018-9197. http://resolver.caltech.edu/CaltechAUTHORS:KUSieeejqe79

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Abstract

A continuous glow discharge was applied to a Cu/CuCl double pulse laser. Maximum laser pulse energy was observed to increase as much as 35 percent at low buffer gas pressure and 3.5 percent at optimum buffer gas pressure. Minimum and optimum time delays decreased with increasing glow discharge current. The greater pulse energy may be due to increased rate of current rise of the pumping discharge pulse, and decreased contribution to the population of metastable copper from ion recombination.


Item Type:Article
Additional Information:© Copyright 1979 IEEE. Reprinted with permission. Manuscript received March 15, 1979; revised May 1, 1979.
Record Number:CaltechAUTHORS:KUSieeejqe79
Persistent URL:http://resolver.caltech.edu/CaltechAUTHORS:KUSieeejqe79
Alternative URL:http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=23000&arnumber=1070243
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:10309
Collection:CaltechAUTHORS
Deposited By: Archive Administrator
Deposited On:23 Apr 2008
Last Modified:26 Dec 2012 09:59

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