Harris, J. M. and Lugujjo, E. and Campisano, S. U. and Nicolet, M-A. and Shima, R. (1975) Studies on the Al2O3–Ti–Mo–Au metallization system. Journal of Vacuum Science and Technology, 12 (1). pp. 524-527. ISSN 0022-5355 http://resolver.caltech.edu/CaltechAUTHORS:HARjvst75a
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Abstract
The behavior of Ti–Mo–Au metallization on Al2O3 and C has been investigated by backscattering spectrometry. Results show that Mo–Au bimetal films typically mix during deposition. Diffusion of Ti in Mo film occurs at 600°C, but is inhibited by the presence of oxygen in the Ti film. Even 1000 Å of Mo is not a barrier against interdiffusion of Ti and Au during 20–min anneals at 600°C. The amount of mixing observed also depends on the nature of the substrate which supports the Ti–Mo–Au metallization.
| Item Type: | Article |
|---|---|
| Additional Information: | © 1975 American Vacuum Society. (Received 19 August 1974; final form 27 September 1974) We would like to thank to express our grateful appreciation to Motorola, Scottsdale, Arizona, for their participation in this project. |
| Record Number: | CaltechAUTHORS:HARjvst75a |
| Persistent URL: | http://resolver.caltech.edu/CaltechAUTHORS:HARjvst75a |
| Alternative URL: | http://dx.doi.org/10.1116/1.568580 |
| Usage Policy: | No commercial reproduction, distribution, display or performance rights in this work are provided. |
| ID Code: | 11023 |
| Collection: | CaltechAUTHORS |
| Deposited By: | Archive Administrator |
| Deposited On: | 23 Jun 2008 |
| Last Modified: | 26 Dec 2012 10:07 |
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