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Confining substrate for micron-thick liquid films

Kuech, T. F. and McCaldin, J. O. (1980) Confining substrate for micron-thick liquid films. Applied Physics Letters, 37 (1). pp. 44-46. ISSN 0003-6951. http://resolver.caltech.edu/CaltechAUTHORS:KUEapl80

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Abstract

Suitable combinations of surface geometry and material enable a substrate to hold a thin liquid film captive on its surface. Though only at metastable equilibrium, such films can survive a moderate amount of processing. They may be suited to the growth of semiconductor single-crystal films on amorphous substrates.


Item Type:Article
Additional Information:Copyright © 1980 American Institute of Physics Received 3 April 1980; accepted for publication 21 April 1980 This work was supported in part by the Joint Services Electronics Program.
Subject Keywords:FILMS; LIQUIDS; THICKNESS; SUBSTRATES; CONTAINERS; CONFIGURATION; SURFACES; METASTABLE STATES; EQUILIBRIUM; MONOCRYSTALS; AMORPHOUS STATE; SEMICONDUCTOR MATERIALS; LEAD; BISMUTH; SILICON OXDIES; INDIUM; GALLIUM; GOLD ALLOYS; GERMANIUM ALLOYS
Record Number:CaltechAUTHORS:KUEapl80
Persistent URL:http://resolver.caltech.edu/CaltechAUTHORS:KUEapl80
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:1128
Collection:CaltechAUTHORS
Deposited By: Archive Administrator
Deposited On:21 Dec 2005
Last Modified:26 Dec 2012 08:42

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