So, F. C. T. and Kolawa, E. and Zhao, X.-A. and Pan, E. T-S. and Nicolet, M.-A. (1987) Summary Abstract: Reactively sputtered RuO2 and Mo–O diffusion barriers. Journal of Vacuum Science and Technology B, 5 (6). pp. 1748-1749. ISSN 1071-1023. http://resolver.caltech.edu/CaltechAUTHORS:SOFjvstb87
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In this report, we summarize the important aspects of the deposition behavior of RuOz and Mo-O films formed by radio frequency (rf) reactive sputtering and their diffusion barrier properties against interdiffusion in Al-Si couples.
|Additional Information:||© 1987 American Vacuum Society. (Received 15 June 1987; accepted 3 August 1987) The authors gratefully acknowledge the financial support from the Army Research Office under Contract No. DAAG29-85-K-0192, and Intel Corporation.|
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|Deposited On:||18 Sep 2008 20:53|
|Last Modified:||26 Dec 2012 10:18|
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