So, F. C. T. and Kolawa, E. and Zhao, X.-A. and Pan, E. T-S. and Nicolet, M.-A. (1987) Summary Abstract: Reactively sputtered RuO2 and Mo–O diffusion barriers. Journal of Vacuum Science and Technology B, 5 (6). pp. 1748-1749. ISSN 1071-1023 http://resolver.caltech.edu/CaltechAUTHORS:SOFjvstb87
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Abstract
In this report, we summarize the important aspects of the deposition behavior of RuOz and Mo-O films formed by radio frequency (rf) reactive sputtering and their diffusion barrier properties against interdiffusion in Al-Si couples.
| Item Type: | Article | ||||||
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| Additional Information: | © 1987 American Vacuum Society. (Received 15 June 1987; accepted 3 August 1987) The authors gratefully acknowledge the financial support from the Army Research Office under Contract No. DAAG29-85-K-0192, and Intel Corporation. | ||||||
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| Record Number: | CaltechAUTHORS:SOFjvstb87 | ||||||
| Persistent URL: | http://resolver.caltech.edu/CaltechAUTHORS:SOFjvstb87 | ||||||
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| Usage Policy: | No commercial reproduction, distribution, display or performance rights in this work are provided. | ||||||
| ID Code: | 11679 | ||||||
| Collection: | CaltechAUTHORS | ||||||
| Deposited By: | Archive Administrator | ||||||
| Deposited On: | 18 Sep 2008 20:53 | ||||||
| Last Modified: | 26 Dec 2012 10:18 |
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