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Summary Abstract: Reactively sputtered RuO2 and Mo–O diffusion barriers

So, F. C. T. and Kolawa, E. and Zhao, X.-A. and Pan, E. T-S. and Nicolet, M.-A. (1987) Summary Abstract: Reactively sputtered RuO2 and Mo–O diffusion barriers. Journal of Vacuum Science and Technology B, 5 (6). pp. 1748-1749. ISSN 1071-1023. http://resolver.caltech.edu/CaltechAUTHORS:SOFjvstb87

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Abstract

In this report, we summarize the important aspects of the deposition behavior of RuOz and Mo-O films formed by radio frequency (rf) reactive sputtering and their diffusion barrier properties against interdiffusion in Al-Si couples.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1116/1.583631DOIUNSPECIFIED
Additional Information:© 1987 American Vacuum Society. (Received 15 June 1987; accepted 3 August 1987) The authors gratefully acknowledge the financial support from the Army Research Office under Contract No. DAAG29-85-K-0192, and Intel Corporation.
Funders:
Funding AgencyGrant Number
Army Research OfficeDAAG29-85-K-0192
Intel Corp.UNSPECIFIED
Record Number:CaltechAUTHORS:SOFjvstb87
Persistent URL:http://resolver.caltech.edu/CaltechAUTHORS:SOFjvstb87
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:11679
Collection:CaltechAUTHORS
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Deposited On:18 Sep 2008 20:53
Last Modified:26 Dec 2012 10:18

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