Wong, Selmer S. and He, Gang and Nikzad, Shouleh and Ahn, Channing C. and Atwater, Harry A. (1995) Local order measurement in SnGe alloys and monolayer Sn films on Si with reflection electron energy loss spectrometry. Journal of the Vacuum Society of America A, 13 (2). pp. 216-220. ISSN 0734-2101 http://resolver.caltech.edu/CaltechAUTHORS:WONjvsta95
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Measurements of local order are demonstrated in Sn-containing alloys and epitaxial monolayer thickness films by analysis of extended-edge energy loss fine structure (EXELFS) data obtained by reflection electron energy loss spectrometry (REELS). These measurements of short-range order provide a complement to the chemical information obtained with REELS and long-range order obtained using reflection high energy electron diffraction. The results suggest that EXELFS measurements are practical for samples mounted on the growth manipulator in a molecular beam epitaxy chamber. Advantages and limitations of reflection EXELFS are discussed.
|Additional Information:||© 1995 American Vacuum Society. Received 28 March 1994; accepted 12 November 1994. This work was supported by the National Science Foundation (DMR-9202587).|
|Subject Keywords:||SILICON, TIN, BINARY ALLOYS, TIN ALLOYS, GERMANIUM ALLOYS, MONOLAYERS, SHORT–RANGE ORDER, EEL SPECTROSCOPY, REFLECTION|
|Usage Policy:||No commercial reproduction, distribution, display or performance rights in this work are provided.|
|Deposited By:||Archive Administrator|
|Deposited On:||29 Oct 2008 06:02|
|Last Modified:||26 Dec 2012 10:28|
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