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MeV oxygen ion implantation induced compositional intermixing in AlAs/GaAs superlattices

Xiong, Fulin and Tombrello, T. A. and Schwartz, C. L. and Schwarz, S. A. (1990) MeV oxygen ion implantation induced compositional intermixing in AlAs/GaAs superlattices. Applied Physics Letters, 57 (9). pp. 896-898. ISSN 0003-6951. http://resolver.caltech.edu/CaltechAUTHORS:XIOapl90

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Abstract

We present in this letter an investigation of compositional intermixing in AlAs/GaAs superlattices induced by 2 MeV oxygen ion implantation. The results are compared with implantation at 500 keV. In addition to Al intermixing in the direct lattice damage region by nuclear collision spikes, as is normally present in low-energy ion implantation, Al interdiffusion has also been found to take place in the subsurface region where MeV ion induced electronic spike damage dominates and a uniform strain field builds up due to defect generation and diffusion. Uniform compositional intermixing of the superlattices results after subsequent thermal annealing when Al interdiffusion is stimulated through recovery of the implantation-induced lattice strain field, the reconstruction and the redistribution of lattice defects, and annealing of lattice damage.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1063/1.103397DOIUNSPECIFIED
http://link.aip.org/link/?APPLAB/57/896/1PublisherUNSPECIFIED
Additional Information:Copyright © 1990 American Institute of Physics. Received 20 April 1990; accepted 25 June 1990. This work is supported in part by the National Science Foundation grant DMR88-11795. The author (F.X.) is grateful to Dr. H. Wang and Professor Amnon Yariv at Caltech, Professor Hadis Morkoç at University of Illinois, and Dr. T. Venkatesan at Bellcore for their encouragement of this work and their valuable advice.
Funders:
Funding AgencyGrant Number
National Science FoundationDMR88-11795
Subject Keywords:SUPERLATTICES, ALUMINUM ARSENIDES, GALLIUM ARSENIDES, ION IMPLANTATION, OXYGEN IONS, PHYSICAL RADIATION EFFECTS, ATOM TRANSPORT, DIFFUSION, ANNEALING, DAMAGE, INTERFACE STRUCTURE
Record Number:CaltechAUTHORS:XIOapl90
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Deposited On:21 Dec 2008 05:23
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