Baehr-Jones, Tom and Hochberg, Michael and Walker, Chris and Scherer, Axel (2004) High-Q ring resonators in thin silicon-on-insulator. Applied Physics Letters, 85 (16). pp. 3346-3347. ISSN 0003-6951 http://resolver.caltech.edu/CaltechAUTHORS:BAEapl04
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Abstract
We have fabricated high-Q microrings from thin silicon-on-insulater SOI layers and measured Q values of 45 000 in these rings, which were then improved to 57 000 by adding a PMMA cladding. The optimal waveguide designs were calculated, and the waveguide losses were analyzed. These high-Q resonators are expected to lead to interesting devices for telecommunication filters and sources as well as optical refractive index sensing.
| Item Type: | Article |
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| Additional Information: | ©2004 American Institute of Physics (Received 2 February 2004; accepted 11 June 2004) Funding from DARPA supporting this effort under Contract No. NAV N000421-02-D-3223 DO0001 is gratefully acknowledged. The authors also wish to thank Dow Corning for providing the electron beam resist and SiGen for supplying SOI wafers. |
| Subject Keywords: | silicon-on-insulator; optical resonators; optical losses; thin films; microcavities; claddings; refractive index; optical waveguides; micro-optics |
| Record Number: | CaltechAUTHORS:BAEapl04 |
| Persistent URL: | http://resolver.caltech.edu/CaltechAUTHORS:BAEapl04 |
| Alternative URL: | http://dx.doi.org/10.1063/1.1781355 |
| Usage Policy: | No commercial reproduction, distribution, display or performance rights in this work are provided. |
| ID Code: | 1303 |
| Collection: | CaltechAUTHORS |
| Deposited By: | Archive Administrator |
| Deposited On: | 09 Jan 2006 |
| Last Modified: | 26 Dec 2012 08:43 |
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