Baehr-Jones, Tom and Hochberg, Michael and Walker, Chris and Scherer, Axel (2004) High-Q ring resonators in thin silicon-on-insulator. Applied Physics Letters, 85 (16). pp. 3346-3347. ISSN 0003-6951 http://resolver.caltech.edu/CaltechAUTHORS:BAEapl04
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We have fabricated high-Q microrings from thin silicon-on-insulater SOI layers and measured Q values of 45 000 in these rings, which were then improved to 57 000 by adding a PMMA cladding. The optimal waveguide designs were calculated, and the waveguide losses were analyzed. These high-Q resonators are expected to lead to interesting devices for telecommunication filters and sources as well as optical refractive index sensing.
|Additional Information:||©2004 American Institute of Physics (Received 2 February 2004; accepted 11 June 2004) Funding from DARPA supporting this effort under Contract No. NAV N000421-02-D-3223 DO0001 is gratefully acknowledged. The authors also wish to thank Dow Corning for providing the electron beam resist and SiGen for supplying SOI wafers.|
|Subject Keywords:||silicon-on-insulator; optical resonators; optical losses; thin films; microcavities; claddings; refractive index; optical waveguides; micro-optics|
|Usage Policy:||No commercial reproduction, distribution, display or performance rights in this work are provided.|
|Deposited By:||Archive Administrator|
|Deposited On:||09 Jan 2006|
|Last Modified:||26 Dec 2012 08:43|
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