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High-Q ring resonators in thin silicon-on-insulator

Baehr-Jones, Tom and Hochberg, Michael and Walker, Chris and Scherer, Axel (2004) High-Q ring resonators in thin silicon-on-insulator. Applied Physics Letters, 85 (16). pp. 3346-3347. ISSN 0003-6951. http://resolver.caltech.edu/CaltechAUTHORS:BAEapl04

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Abstract

We have fabricated high-Q microrings from thin silicon-on-insulater SOI layers and measured Q values of 45 000 in these rings, which were then improved to 57 000 by adding a PMMA cladding. The optimal waveguide designs were calculated, and the waveguide losses were analyzed. These high-Q resonators are expected to lead to interesting devices for telecommunication filters and sources as well as optical refractive index sensing.


Item Type:Article
Additional Information:©2004 American Institute of Physics (Received 2 February 2004; accepted 11 June 2004) Funding from DARPA supporting this effort under Contract No. NAV N000421-02-D-3223 DO0001 is gratefully acknowledged. The authors also wish to thank Dow Corning for providing the electron beam resist and SiGen for supplying SOI wafers.
Subject Keywords:silicon-on-insulator; optical resonators; optical losses; thin films; microcavities; claddings; refractive index; optical waveguides; micro-optics
Record Number:CaltechAUTHORS:BAEapl04
Persistent URL:http://resolver.caltech.edu/CaltechAUTHORS:BAEapl04
Alternative URL:http://dx.doi.org/10.1063/1.1781355
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:1303
Collection:CaltechAUTHORS
Deposited By: Archive Administrator
Deposited On:09 Jan 2006
Last Modified:26 Dec 2012 08:43

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