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Soft lithography replica molding of critically coupled polymer microring resonators

Poon, Joyce K. S. and Huang, Yanyi and Paloczi, George T. and Yariv, Amnon (2004) Soft lithography replica molding of critically coupled polymer microring resonators. IEEE Photonics Technology Letters, 16 (11). pp. 2496-2498. ISSN 1041-1135. http://resolver.caltech.edu/CaltechAUTHORS:POOieeeptl04b

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Abstract

We use soft lithography replica molding to fabricate unclad polystyrene (PS) and clad SU-8 microring resonator filters. The PS resonator has an intrinsic quality factor of 1.0/spl times/10/sup 4/ at /spl lambda/=1.55 /spl mu/m, while that of the SU-8 resonator is 7100. The extinction ratios of the PS and SU-8 microring filters are -12 and -20 dB, respectively, with net insertion losses of 6.7 and 9.9 dB. The good quality factors and high extinction ratios of the microring resonator filters show the practicality of soft-lithography replica molding for the fabrication of integrated optical devices.


Item Type:Article
Additional Information:© Copyright 2004 IEEE. Reprinted with permission. Manuscript received May 20, 2004; revised July 8, 2004. This work was supported by the National Science Foundation (NSF), Defense Advanced Research Projects Agency (DARPA), and Hughes Research Laboratories (HRL). The work of J. Poon was supported by an NSERC-Julie Payette scholarship.
Subject Keywords:Optical device fabrication, optical polymers, optical resonators
Record Number:CaltechAUTHORS:POOieeeptl04b
Persistent URL:http://resolver.caltech.edu/CaltechAUTHORS:POOieeeptl04b
Alternative URL:http://dx.doi.org/10.1109/LPT.2004.835610
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:2007
Collection:CaltechAUTHORS
Deposited By: Archive Administrator
Deposited On:01 Mar 2006
Last Modified:26 Dec 2012 08:47

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