Fontcuberta i Morral, A. and Zahler, J. M. and Atwater, Harry A. and Ahrenkiel, S. P. and Wanlass, M. W. (2003) InGaAs/InP double heterostructures on InP/Si templates fabricated by wafer bonding and hydrogen-induced exfoliation. Applied Physics Letters, 83 (26). pp. 5413-5415. ISSN 0003-6951 http://resolver.caltech.edu/CaltechAUTHORS:FONapl03
See Usage Policy.
Use this Persistent URL to link to this item: http://resolver.caltech.edu/CaltechAUTHORS:FONapl03
Hydrogen-induced exfoliation combined with wafer bonding has been used to transfer ~600-nm-thick films of (100) InP to Si substrates. Cross-section transmission electron microscopy (TEM) shows a transferred crystalline InP layer with no observable defects in the region near the bonded interface and an intimately bonded interface. InP and Si are covalently bonded as inferred by the fact that InP/Si pairs survived both TEM preparation and thermal cycles up to 620 °C necessary for metalorganic chemical vapor deposition growth. The InP transferred layers were used as epitaxial templates for the growth of InP/In0.53Ga0.47As/InP double heterostructures. Photoluminescence measurements of the In0.53Ga0.47As layer show that it is optically active and under tensile strain, due to differences in the thermal expansion between InP and Si. These are promising results in terms of a future integration of Si electronics with optical devices based on InP-lattice-matched materials.
|Additional Information:||©2003 American Institute of Physics. (Received 23 January 2003; accepted 3 November 2003) This work was supported by the National Renewable Energy Laboratory and NASA. The authors acknowledge L. Gedvilas for measuring the photoluminescence spectra and J. Carapella for performing the metalorganic vapor phase epitaxy growths. Helpful discussion with C. G. Gahn, A. Risbud, and A. Ghaffari are gratefully acknowledged.|
|Subject Keywords:||indium compounds; gallium arsenide; III-V semiconductors; silicon; elemental semiconductors; semiconductor heterojunctions; wafer bonding; transmission electron microscopy; interface structure; MOCVD; vapour phase epitaxial growth; semiconductor growth; photoluminescence|
|Usage Policy:||No commercial reproduction, distribution, display or performance rights in this work are provided.|
|Deposited By:||Archive Administrator|
|Deposited On:||26 Apr 2006|
|Last Modified:||26 Dec 2012 08:50|
Repository Staff Only: item control page