Xu, W. and Wong, J. and Cheng, C. C. and Johnson, R. and Scherer, A. (1995) Fabrication of ultrasmall magnets by electroplating. Journal of Vacuum Science and Technology B, 13 (6). pp. 2372-2375. ISSN 1071-1023. http://resolver.caltech.edu/CaltechAUTHORS:XUWjvstb95
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We use high voltage electron beam lithography followed by electroplating to define small metal features on semiconductor substrates. These have been used to form high resolution etch masks, dense nanomagnet arrays, and highly anisotropic metal nanostructures. To reproducibly obtain uniform arrays of such structures, we have developed an end-point detection technique, which is based on in situ observation of the electrodeposition process.
|Additional Information:||©1995 American Vacuum Society (Received 2 June 1992; accepted 15 September 1995) The authors wish to acknowledge many helpful discussions with S. Heckman at Hughes Research Laboratory and Dr. S. Schultz and R. O’Barr from the Center for Magnetic Recording Research (CMRR) at the University of California, San Diego. This work was supported in part by NSF Grant No. ECS93-10681.|
|Subject Keywords:||ASPECT RATIO; ELECTRODEPOSITION; MAGNETIC STORAGE DEVICES; NICKEL; LITHOGRAPHY; NANOSTRUCTURES|
|Usage Policy:||No commercial reproduction, distribution, display or performance rights in this work are provided.|
|Deposited By:||Archive Administrator|
|Deposited On:||03 May 2006|
|Last Modified:||26 Dec 2012 08:51|
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