Choi, S. H. and Wang, K. L. and Leung, M. S. and Stupian, G. W. and Presser, N. and Chung, S. W. and Markovich, G. and Kim, S. H. and Heath, J. R. (1999) Fabrication of nanometer size photoresist wire patterns with a silver nanocrystal shadowmask. Journal of Vacuum Science and Technology A, 17 (4). pp. 1425-1427. ISSN 0734-2101 http://resolver.caltech.edu/CaltechAUTHORS:20120110-132111493
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In this article, we present a new method for fabricating precisely defined nanometer scale photoresist wire patterns. The Langmuir technique was utilized to form high aspect ratio lamellae, or wire patterns, of Ag nanocrystals at the air/water interface, and these patterns were transferred onto resist-coated substrates as a Langmuir–Schaeffer film and as a shadowmask. The wire patterns were transferred to the photoresist material by spatially selective electron beam exposure on the Ag nanocrystal wire shadowmask. Monte Carlo simulation was done to estimate the electron stopping power for the Ag nanocrystal shadowmask at low voltage.
|Additional Information:||© 1999 American Vacuum Society. Received 13 October 1998; accepted 19 April 1999. This work was partially supported by the Augmentation Awards for Science & Engineering Research Training (AASERT) Fellowship Grant No. N00014-96-1-1258, the Office of Naval Research MURI, and ARO MURI and the U.S. Air Force under Contract No. F04701-93-C-0094. One of the authors (J.R.H.) acknowledges the Office of Naval Research Contract No. N00014-981-0422, and the Packard Foundation. The authors also wish to thank M. Tuelling and R. Robertson at the Aerospace corporation for useful assistance.|
|Subject Keywords:||silver, nanotechnology, photoresists, electron beam lithography, proximity effect (lithography), Langmuir-Blodgett films, self-assembly, nanostructured materials, masks, Monte Carlo methods, energy loss of particles, quantum wires, field emission electron microscopy|
|Classification Code:||PACS: 81.07.-b; 81.16.-c; 85.35.-p; 85.40.Hp; 68.18.-g|
|Official Citation:||Fabrication of nanometer size photoresist wire patterns with a silver nanocrystal shadowmask S. H. Choi, K. L. Wang, M. S. Leung, G. W. Stupian, N. Presser, S. W. Chung, G. Markovich, S. H. Kim, and J. R. Heath J. Vac. Sci. Technol. A 17, 1425 (1999); doi:10.1116/1.581831 (3 pages)|
|Usage Policy:||No commercial reproduction, distribution, display or performance rights in this work are provided.|
|Deposited By:||Ruth Sustaita|
|Deposited On:||10 Jan 2012 21:47|
|Last Modified:||10 Jan 2012 21:47|
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