Yoon, Euijoon and Green, Christian A. and Gottscho, Richard A. and Hayes, Todd R. and Giapis, Konstantinos P. (1992) Latent image diffraction from submicron photoresist gratings. Journal of Vacuum Science and Technology B, 10 (5). pp. 2230-2233. ISSN 1071-1023 http://resolver.caltech.edu/CaltechAUTHORS:20120322-135630455
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Light scattering from latent images in photoresist is useful for lithographic tool characterization, process monitoring, and process control. In particular, closed‐loop control of lithographic processes is critical for high yield, low cost device manufacturing. In this work, we report use of pulsed laser diffraction from photoresist latent images in 0.24 μm pitch distributed feedback laser gratings. Gated detection of pulsed light scattering permits high spatial resolution probing using ultraviolet light without altering the latent image. A correlation between latent image and etched grating diffraction efficiencies is demonstrated and shows the value of "upstream" monitoring.
|Additional Information:||© 1992 American Vacuum Society. Received 6 April 1992; accepted 17 June 1992.|
|Subject Keywords:||PHOTORESISTS, LITHOGRAPHY, LIGHT DIFFRACTION, GRATINGS, IMAGES, SPATIAL RESOLUTION, CONTROL SYSTEMS|
|Classification Code:||PACS: 85.40.Hp|
|Usage Policy:||No commercial reproduction, distribution, display or performance rights in this work are provided.|
|Deposited By:||Tony Diaz|
|Deposited On:||17 Apr 2012 22:18|
|Last Modified:||26 Dec 2012 14:58|
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