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The influence of surface currents on pattern-dependent charging and notching

Hwang, Gyeong S. and Giapis, Konstantinos P. (1998) The influence of surface currents on pattern-dependent charging and notching. Journal of Applied Physics, 84 (2). pp. 683-689. ISSN 0021-8979. http://resolver.caltech.edu/CaltechAUTHORS:HWAjap98b

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Abstract

Surface charge dissipation on insulator surfaces can reduce local charging potentials thereby preventing ion trajectory deflection at the bottom of trenches that leads to lateral sidewall etching (notching). We perform detailed Monte Carlo simulations of pattern-dependent charging during etching in high-density plasmas with the maximum sustainable surface electric field as a parameter. Significant notching occurs for a threshold electric field as low as 0.5 MV/cm or 50 V/µm, which is reasonable for the surface of good insulators. The results support pattern-dependent charging as the leading cause of notching and suggest that the problem will disappear as trench widths are reduced.


Item Type:Article
Additional Information:©1998 American Institute of Physics. (Received 23 March 1998; accepted 14 April 1998) This work was supported by a NSF-Career Award and a Camille Dreyfus Teacher-Scholar Award awarded to K.P.G.
Subject Keywords:surface charging; sputter etching; Monte Carlo methods; surface conductivity
Record Number:CaltechAUTHORS:HWAjap98b
Persistent URL:http://resolver.caltech.edu/CaltechAUTHORS:HWAjap98b
Alternative URL:http://dx.doi.org/10.1063/1.368123
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:3005
Collection:CaltechAUTHORS
Deposited By: Archive Administrator
Deposited On:10 May 2006
Last Modified:26 Dec 2012 08:52

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