Cleland, A. N. and Roukes, M. L. (1996) Fabrication of high frequency nanometer scale mechanical resonators from bulk Si crystals. Applied Physics Letters, 69 (18). pp. 2653-2655. ISSN 0003-6951. http://resolver.caltech.edu/CaltechAUTHORS:CLEapl96
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We report on a method to fabricate nanometer scale mechanical structures from bulk, single-crystal Si substrates. A technique developed previously required more complex fabrication methods and an undercut step using wet chemical processing. Our method does not require low pressure chemical vapor deposition of intermediate masking layers, and the final step in the processing uses a dry etch technique, avoiding the difficulties encountered from surface tension effects when wet processing mechanically delicate or large aspect ratio structures. Using this technique, we demonstrate fabrication of a mechanical resonator with a fundamental resonance frequency of 70.72 MHz and a quality factor of 2 x 10^(4).
|Additional Information:||©1996 American Institute of Physics. Received 21 June 1996; accepted 22 August 1996. The authors acknowledge Dr. Axel Scherer for many valuable conversations, and for use of his reactive ion etch system. This work was supported by ARPA under Contract No. DABT63-95-C-0112.|
|Subject Keywords:||SILICON; RESONATORS; FABRICATION; CVD; LITHOGRAPHY; MECHANICAL STRUCTURES|
|Usage Policy:||No commercial reproduction, distribution, display or performance rights in this work are provided.|
|Deposited By:||Tony Diaz|
|Deposited On:||11 May 2006|
|Last Modified:||26 Dec 2012 08:52|
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