Shi, G. and Seinfeld, J. H. and Okuyama, K. (1990) Homogeneous nucleation in spatially inhomogeneous systems. Journal of Applied Physics, 68 (9). pp. 4550-4555. ISSN 0021-8979. http://resolver.caltech.edu/CaltechAUTHORS:20120503-090648960
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Homogeneous nucleation of a vapor in the presence of the loss of clusters by diffusion and thermophoretic drift is investigated. Analytical results are obtained for the cluster size distribution and the rate of nucleation by solving the modified kinetic equation for nucleation. The implications of cluster loss by diffusion and phoretic drift on the onset of the homogeneous nucleation of silicon vapor in the horizontal epitaxial chemical vapor deposition reactor is discussed. The range of conditions under which the loss of subcritical clusters by diffusion and drift becomes important for the interpretation of diffusion cloud chamber experimental data of the onset conditions of the homogeneous nucleation of vapors is also delineated.
|Additional Information:||© 1990 American Institute of Physics. Received 5 March 1990; accepted for publication 9 July 1990.|
|Subject Keywords:||NUCLEATION, CHEMICAL REACTION KINETICS, ANALYTICAL SOLUTION, HOMOGENEITY, DIFFUSION, VAPORS, CHEMICAL VAPOR DEPOSITION, KINETIC EQUATIONS|
|Classification Code:||PACS: 64.60.Q-; 68.03.Fg; 68.43.Mn; 82.60.Nh; 05.70.-a|
|Usage Policy:||No commercial reproduction, distribution, display or performance rights in this work are provided.|
|Deposited By:||Tony Diaz|
|Deposited On:||03 May 2012 20:52|
|Last Modified:||26 Dec 2012 15:09|
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