Banwell, T. and Nicolet, M-A. and Sands, T. and Grunthaner, P. J. (1987) Chemical effects in ion mixing of a ternary system (metal-SiO_2). Applied Physics Letters, 50 (10). pp. 571-573. ISSN 0003-6951 http://resolver.caltech.edu/CaltechAUTHORS:20120622-075340401
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The mixing of Ti, Cr, and Ni thin films with SiO_2 by low‐temperature (−196–25 °C) irradiation with 290 keV Xe has been investigated. Comparison of the morphology of the intermixed region and the dose dependences of net metal transport into SiO_2 reveals that long range motion and phase formation probably occur as separate and sequential processes. Kinetic limitations suppress chemical effects in these systems during the initial transport process. Chemical interactions influence the subsequent phase formation.
|Additional Information:||© 1987 American Institute of Physics. Received 31 July 1986; accepted for publication 12 January 1987. This work was financially supported in part by the Office of Naval Research under contract No. N00014-84-K-0275 and by the National Science Foundation under grant No. DMR-8421119. T. Ban well thanks IBM for a fellowship during this work.|
|Subject Keywords:||TERNARY ALLOY SYSTEMS, MORPHOLOGY, MIXING, SILICA, PHYSICAL RADIATION EFFECTS, TITANIUM, CHROMIUM, NICKEL, PHASE TRANSFORMATIONS, KINETICS, KEV RANGE, MORPHOLOGY|
|Classification Code:||PACS: 61.80.Jh, 68.55.-a, 68.55.Nq, 68.35.Fx|
|Official Citation:||Chemical effects in ion mixing of a ternary system (metal‐SiO2) T. Banwell, M‐A. Nicolet, T. Sands, and P. J. Grunthaner Appl. Phys. Lett. 50, 571 (1987); http://dx.doi.org/10.1063/1.98138|
|Usage Policy:||No commercial reproduction, distribution, display or performance rights in this work are provided.|
|Deposited By:||Ruth Sustaita|
|Deposited On:||22 Jun 2012 15:08|
|Last Modified:||26 Dec 2012 15:22|
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