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Influence of atomic mixing and preferential sputtering on depth profiles and interfaces

Liau, Z. L. and Tsaur, B. Y. and Mayer, J. W. (1979) Influence of atomic mixing and preferential sputtering on depth profiles and interfaces. Journal of Vacuum Science and Technology, 16 (2). pp. 121-127. ISSN 0022-5355. http://resolver.caltech.edu/CaltechAUTHORS:20120726-092329135

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Abstract

Atomic mixing and preferential sputtering impose a depth resolution limit on the use of sputter sectioning to measure the composition of metal–semiconductor interfaces. Experimental evidence obtained with the Pt–Si system is used to demonstrate ion‐induced atomic mixing and then its effect on sputter etching and depth profiling. Starting with discrete layer structures, a relatively low ion dose (≳3×10^(15) cm^(−2)) first produced a mixed surface layer with thickness comparable to the ion range. Higher ion doses then result in successive sputter etching and continual atomic mixing over a constant surface layer thickness. A model is developed that is based on a sputter removal (including preferential sputtering) of atoms at the surface and a uniform mixing of atoms over a constant thickness. The model predicts the influences of atomic mixing and preferential sputtering on the depth profiling of thin‐film structures and interfaces.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1116/1.569883DOIUNSPECIFIED
http://avspublications.org/jvst/resource/1/jvstal/v16/i2/p121_s1PublisherUNSPECIFIED
Additional Information:© 1979 American Vacuum Society. Received 28 October 1978; accepted 18 December 1978. The authors are indebted to their colleagues: G. E. Chapman, S. E. Matteson, J. K. Hirvonen (Naval Research Lab.), and J. M. Poate (Bell Labs), for their interest and participation in part of the present experimental work. They are also indebted to D. M. Scott, whose work on the accelerator made most data in this paper possible, and to J. J. Mallory for his skillful sample preparations. The partial financial support of the Army Research Office is gratefully acknowledged.
Funders:
Funding AgencyGrant Number
Army Research Office (ARO)UNSPECIFIED
Classification Code:PACS: 81.15.Jj, 81.15.Cd, 92.0N.c, 81.90. + c, 79.20.Rf
Record Number:CaltechAUTHORS:20120726-092329135
Persistent URL:http://resolver.caltech.edu/CaltechAUTHORS:20120726-092329135
Official Citation: Influence of atomic mixing and preferential sputtering on depth profiles and interfaces Z. L. Liau, B. Y. Tsaur, and J. W. Mauer J. Vac. Sci. Technol. 16, 121 (1979); http://dx.doi.org/10.1116/1.569883
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:32738
Collection:CaltechAUTHORS
Deposited By: Ruth Sustaita
Deposited On:26 Jul 2012 23:32
Last Modified:26 Dec 2012 15:44

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