Vossmeyer, T. and Jia, S. and Delonno, E. and Diehl, M. R. and Kim, S.-H. and Peng, X. and Alivisatos, A. P. and Heath, J. R. (1998) Combinatorial approaches toward patterning nanocrystals. Journal of Applied Physics, 84 (7). pp. 3664-3670. ISSN 0021-8979 http://resolver.caltech.edu/CaltechAUTHORS:VOSjap98
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Abstract
A scheme for generating complex, spatially separated patterns of multiple types of semiconducting and/or metallic nanocrystals is presented. The process is based on lithographic patterning of organic monolayers that contain a photolabile protection group and are covalently bound to SiO2 surfaces. The process results in spatially and chemically distinct interaction sites on a single substrate. Nanocrystal assembly occurs with a high selectivity on just one type of site. We report on the production of binary, tertiary, and quatemary patterns of nanocrystals. We highlight and discuss the differences between nanocrystal/substrate assembly and molecule/substrate assembly. Finally, we investigate the assembled structures using photoluminescence and absorption spectroscopy.
| Item Type: | Article |
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| Additional Information: | ©1998 American Institute of Physics. (Received 7 April 1998; accepted 7 July 1998) This work was part of a joint UCLA/UC Berkeley/Hewlett Packard effort supported by an NSF-GOALI Grant. One of the authors (J.R.H.) also acknowledges support from the David and Lucile Packard Foundation, and a Sloan Fellowship. One of the authors (T.L.V.) would like to thank the Deutsche Forschungsgemeinschaft (DFG) for partial support. |
| Subject Keywords: | nanotechnology; lithography |
| Record Number: | CaltechAUTHORS:VOSjap98 |
| Persistent URL: | http://resolver.caltech.edu/CaltechAUTHORS:VOSjap98 |
| Alternative URL: | http://dx.doi.org/10.1063/1.368542 |
| Usage Policy: | No commercial reproduction, distribution, display or performance rights in this work are provided. |
| ID Code: | 3285 |
| Collection: | CaltechAUTHORS |
| Deposited By: | Archive Administrator |
| Deposited On: | 25 May 2006 |
| Last Modified: | 26 Dec 2012 08:53 |
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