Kräutle, H. and Nicolet, M-A. and Mayer, J. W. (1974) Kinetics of silicide formation by thin films of V on Si and SiO_2 substrates. Journal of Applied Physics, 45 (8). pp. 3304-3308. ISSN 0021-8979 http://resolver.caltech.edu/CaltechAUTHORS:20120809-110703213
![[img]](http://authors.library.caltech.edu/style/images/fileicons/application_pdf.png)
|
PDF
- Published Version
See Usage Policy. 368Kb |
Use this Persistent URL to link to this item: http://resolver.caltech.edu/CaltechAUTHORS:20120809-110703213
Abstract
The reaction rate of vacuum‐evaporated films of V of the order of 1000 Å thick is investigated by MeV He backscattering spectrometry. On substrates of single‐crystal Si and for anneal times up to several hours in the temperature range 570–650°C, VSi_2 is formed at a linear rate in time. The activation energy of the process is 1.7±0.2 eV. The presence of oxygen in amounts of 10% can significantly decelerate the reaction. On substrates of SiO_2 in the temperature range 730–820°C and anneal times of several hours or less, V_3Si is formed at a square‐root rate in time. The activation energy of this process is 2.0±0.2 eV.
| Item Type: | Article | ||||
|---|---|---|---|---|---|
| Additional Information: | © 1974 American Institute of Physics. Received 6 February 1974. The authors acknowledge helpful discussions with W. K. Chu and J. O. McCaldin. They also thank K.-N. Tu, of IBM, Thomas J. Watson Research Center, for his collaboration and the x-ray analyses of silicide films. Work supported by the Air Force Cambridge Research Laboratory (D. E. Davies). | ||||
| Funders: |
| ||||
| Record Number: | CaltechAUTHORS:20120809-110703213 | ||||
| Persistent URL: | http://resolver.caltech.edu/CaltechAUTHORS:20120809-110703213 | ||||
| Related URLs: | |||||
| Official Citation: | Kinetics of silicide formation by thin films of V on Si and SiO[sub 2] substrates H. Krautle, M-A. Nicolet, and J. W. Mayer, J. Appl. Phys. 45, 3304 (1974), DOI:10.1063/1.1663776 | ||||
| Usage Policy: | No commercial reproduction, distribution, display or performance rights in this work are provided. | ||||
| ID Code: | 33050 | ||||
| Collection: | CaltechAUTHORS | ||||
| Deposited By: | Aucoeur Ngo | ||||
| Deposited On: | 09 Aug 2012 18:31 | ||||
| Last Modified: | 26 Dec 2012 15:55 |
Repository Staff Only: item control page
