CaltechAUTHORS
  A Caltech Library Service

Nonlinear optical properties of photoresists for projection lithography

Kewitsch, Anthony S. and Yariv, Amnon (1996) Nonlinear optical properties of photoresists for projection lithography. Applied Physics Letters, 68 (4). pp. 455-457. ISSN 0003-6951. http://resolver.caltech.edu/CaltechAUTHORS:KEWapl96

[img]
Preview
PDF
See Usage Policy.

722Kb

Use this Persistent URL to link to this item: http://resolver.caltech.edu/CaltechAUTHORS:KEWapl96

Abstract

Optical beams are self-focused and self-trapped upon initiating crosslinking in photoresists. This nonlinear optical phenomenon is apparent only for low average optical intensities and produces index of refraction changes as large as 0.04. We propose using the self-focusing and self-trapping phenomenon in projection photolithography to enhance the resolution and depth of focus.


Item Type:Article
Additional Information:©1996 American Institute of Physics (Received 8 September 1995; accepted 14 November 1995) This work was supported by ARPA’s nonlinear optics (DSO) and lithography (MTO) programs.
Subject Keywords:CROSS–LINKING; LITHOGRAPHY; NONLINEAR OPTICS; PHOTORESISTS; REFRACTIVE INDEX; SELF–FOCUSING; SPATIAL RESOLUTION; TRAPPING
Record Number:CaltechAUTHORS:KEWapl96
Persistent URL:http://resolver.caltech.edu/CaltechAUTHORS:KEWapl96
Alternative URL:http://dx.doi.org/10.1063/1.116411
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:3359
Collection:CaltechAUTHORS
Deposited By: Archive Administrator
Deposited On:01 Jun 2006
Last Modified:26 Dec 2012 08:53

Repository Staff Only: item control page