McCaldin, J. O. (1960) Interaction between Arsenic and Aluminum in Germanium. Journal of Applied Physics, 31 (1). pp. 89-94. ISSN 0021-8979. http://resolver.caltech.edu/CaltechAUTHORS:20120920-094154235
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The behavior of As in Ge containing regions doped with ∼5×10^20∕cc Al was studied. The solubility of As is enhanced tenfold or more by the heavy Al doping, on the basis of (1) measurements of conductivity type and (2) the negative results of a search for compounds by x‐ray diffraction. The behavior of As diffusion fronts was studied by observing the progress of the p‐n junction formed in Ge containing 10^(17)∕cc In. When a region of heavy Al doping was added, the p‐n junction was displaced. The displacements indicate that the diffusing As is attracted to regions of heavy Al doping. These results are similar to those of Reiss, Fuller, and others for Li in Si, though a detailed understanding is not yet available in the present case.
|Additional Information:||© 1960 The American Institute of Physics. Received 28 May 1959. The author wishes to thank T. W. Griswold and H. Winston for helpful suggestions and R. D. Mathis, J. Healy, H. Ross, and J. Blackmon for assistance with the experiments. Thanks are due to J. Bryden, who made the x-ray diffraction examinations.|
|Official Citation:||Interaction between Arsenic and Aluminum in Germanium J. O. McCaldin, J. Appl. Phys. 31, 89 (1960), DOI:10.1063/1.1735425|
|Usage Policy:||No commercial reproduction, distribution, display or performance rights in this work are provided.|
|Deposited By:||Jason Perez|
|Deposited On:||20 Sep 2012 21:23|
|Last Modified:||26 Dec 2012 16:13|
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