Schilling, J. and White, J. and Scherer, A. and Stupian, G. and Hillebrand, R. and Gösele, U. (2005) Three-dimensional macroporous silicon photonic crystal with large photonic band gap. Applied Physics Letters, 86 (1). Art. No. 011101. ISSN 0003-6951 http://resolver.caltech.edu/CaltechAUTHORS:SCHIapl05
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Abstract
Three-dimensional photonic crystals based on macroporous silicon are fabricated by photoelectrochemical etching and subsequent focused-ion-beam drilling. Reflection measurements show a high reflection in the range of the stopgap and indicate the spectral position of the complete photonic band gap. The onset of diffraction which might influence the measurement is discussed.
| Item Type: | Article |
|---|---|
| Additional Information: | ©2005 American Institute of Physics. Received 30 April 2004; accepted 25 October 2004; published online 22 December 2004. J.S. and J.W. would like to thank George R. Rossman for providing the opportunity to use the FTIR spectrometer and microscope for the reflection measurements. |
| Subject Keywords: | silicon; elemental semiconductors; porous semiconductors; photonic crystals; photonic band gap; focused ion beam technology; drilling; etching; lattice constants; Brillouin zones; reflectivity |
| Record Number: | CaltechAUTHORS:SCHIapl05 |
| Persistent URL: | http://resolver.caltech.edu/CaltechAUTHORS:SCHIapl05 |
| Alternative URL: | http://dx.doi.org/10.1063/1.1842855 |
| Usage Policy: | No commercial reproduction, distribution, display or performance rights in this work are provided. |
| ID Code: | 3480 |
| Collection: | CaltechAUTHORS |
| Deposited By: | Tony Diaz |
| Deposited On: | 08 Jun 2006 |
| Last Modified: | 26 Dec 2012 08:54 |
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