Schilling, J. and White, J. and Scherer, A. and Stupian, G. and Hillebrand, R. and Gösele, U. (2005) Three-dimensional macroporous silicon photonic crystal with large photonic band gap. Applied Physics Letters, 86 (1). Art. No. 011101. ISSN 0003-6951. http://resolver.caltech.edu/CaltechAUTHORS:SCHIapl05
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Three-dimensional photonic crystals based on macroporous silicon are fabricated by photoelectrochemical etching and subsequent focused-ion-beam drilling. Reflection measurements show a high reflection in the range of the stopgap and indicate the spectral position of the complete photonic band gap. The onset of diffraction which might influence the measurement is discussed.
|Additional Information:||©2005 American Institute of Physics. Received 30 April 2004; accepted 25 October 2004; published online 22 December 2004. J.S. and J.W. would like to thank George R. Rossman for providing the opportunity to use the FTIR spectrometer and microscope for the reflection measurements.|
|Subject Keywords:||silicon; elemental semiconductors; porous semiconductors; photonic crystals; photonic band gap; focused ion beam technology; drilling; etching; lattice constants; Brillouin zones; reflectivity|
|Usage Policy:||No commercial reproduction, distribution, display or performance rights in this work are provided.|
|Deposited By:||Tony Diaz|
|Deposited On:||08 Jun 2006|
|Last Modified:||09 Mar 2017 05:59|
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