Bartur, M. and Nicolet, M-A. (1984) Self-confined metallic interconnects for very large scale integration. Applied Physics Letters, 44 (2). pp. 263-264. ISSN 0003-6951 http://resolver.caltech.edu/CaltechAUTHORS:BARapl84a
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A novel method to produce narrow metallic lines is presented. Lines of NiSi2 lithographically formed on SiO2 substrates are oxidized. The formed SiO2 layer consumes most of the Si from the silicide, leaving a metallic Ni line fully confined by SiO2. The associated problems together with the potential utilization are discussed.
|Additional Information:||Copyright © 1984 American Institute of Physics (Received 23 September 1983; accepted 24 October 1983) The authors wish to thank M. Van Rossum for the x-ray analysis, and Solid-State Devices, Inc. (A. Applebaum, President) for partial financial and technical support.|
|Subject Keywords:||vlsi; nickel silicides; silicon oxides; lithography; oxidation; line widths; connectors|
|Usage Policy:||No commercial reproduction, distribution, display or performance rights in this work are provided.|
|Deposited By:||Archive Administrator|
|Deposited On:||20 Jul 2006|
|Last Modified:||26 Dec 2012 08:57|
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