Ma, E. and Workman, T. W. and Johnson, W. L. and Nicolet, M-A. (1989) Ion mixing of metal/Al bilayers near 77 K. Applied Physics Letters, 54 (5). pp. 413-415. ISSN 0003-6951 http://resolver.caltech.edu/CaltechAUTHORS:MAEapl89
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Abstract
The efficiency of interfacial ion mixing is measured for metal/Al (metal=Ti, Cr, Ni, and Mo) thin-film bilayers irradiated with 285 keV Xe + ions near 77 K. The results indicate that, as a group, mixing of 3d-metal/Al pairs irradiated by Xe can be explained by neither a pure binary collision cascade nor a pure thermal spike model. Such a situation should exist; that it should be found at the average atomic numbers of the present bilayers is consistent with recent theoretical predictions.
| Item Type: | Article |
|---|---|
| Additional Information: | Copyright © 1989 American Institute of Physics. Received 19 September 1988; accepted 20 November 1988. The authors thank Dr. R. S. Averback and Dr. Y.-T. Cheng for useful comments and discussions. This work was supported in part by National Science Foundation-Materials Research Group-DMR-8811795. |
| Subject Keywords: | MIXING; LAYERS; PHYSICAL RADIATION EFFECTS; NICKEL; TITANIUM; MOLYBDENUM; CHROMIUM; ALUMINIUM; ION COLLISIONS; XENON IONS; COLLISIONS; THIN FILMS; BILAYERS |
| Record Number: | CaltechAUTHORS:MAEapl89 |
| Persistent URL: | http://resolver.caltech.edu/CaltechAUTHORS:MAEapl89 |
| Alternative URL: | http://dx.doi.org/10.1063/1.100937 |
| Usage Policy: | No commercial reproduction, distribution, display or performance rights in this work are provided. |
| ID Code: | 4149 |
| Collection: | CaltechAUTHORS |
| Deposited By: | Tony Diaz |
| Deposited On: | 07 Aug 2006 |
| Last Modified: | 26 Dec 2012 08:58 |
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