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Ion mixing of metal/Al bilayers near 77 K

Ma, E. and Workman, T. W. and Johnson, W. L. and Nicolet, M-A. (1989) Ion mixing of metal/Al bilayers near 77 K. Applied Physics Letters, 54 (5). pp. 413-415. ISSN 0003-6951. http://resolver.caltech.edu/CaltechAUTHORS:MAEapl89

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Abstract

The efficiency of interfacial ion mixing is measured for metal/Al (metal=Ti, Cr, Ni, and Mo) thin-film bilayers irradiated with 285 keV Xe + ions near 77 K. The results indicate that, as a group, mixing of 3d-metal/Al pairs irradiated by Xe can be explained by neither a pure binary collision cascade nor a pure thermal spike model. Such a situation should exist; that it should be found at the average atomic numbers of the present bilayers is consistent with recent theoretical predictions.


Item Type:Article
Additional Information:Copyright © 1989 American Institute of Physics. Received 19 September 1988; accepted 20 November 1988. The authors thank Dr. R. S. Averback and Dr. Y.-T. Cheng for useful comments and discussions. This work was supported in part by National Science Foundation-Materials Research Group-DMR-8811795.
Subject Keywords:MIXING; LAYERS; PHYSICAL RADIATION EFFECTS; NICKEL; TITANIUM; MOLYBDENUM; CHROMIUM; ALUMINIUM; ION COLLISIONS; XENON IONS; COLLISIONS; THIN FILMS; BILAYERS
Record Number:CaltechAUTHORS:MAEapl89
Persistent URL:http://resolver.caltech.edu/CaltechAUTHORS:MAEapl89
Alternative URL:http://dx.doi.org/10.1063/1.100937
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:4149
Collection:CaltechAUTHORS
Deposited By: Tony Diaz
Deposited On:07 Aug 2006
Last Modified:26 Dec 2012 08:58

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