Kurtin, Stephen and Shifrin, Gordon A. and McGill, T. C. (1969) Ion implantation damage of silicon as observed by optical reflection spectroscopy in the 1 to 6 eV region. Applied Physics Letters, 14 (7). pp. 223-225. ISSN 0003-6951. http://resolver.caltech.edu/CaltechAUTHORS:KURapl69
See Usage Policy.
Use this Persistent URL to link to this item: http://resolver.caltech.edu/CaltechAUTHORS:KURapl69
Optical reflection spectra of crystalline, sputtered, and ion implanted silicon specimens are presented. Characteristic aspects of the spectra of ion implanted specimens are related to lattice damage.
|Additional Information:||©1969 The American Institute of Physics. Received 15 November 1968; revised 6 March 1969. We would like to thank R. Hart and D. Jamba of these laboratories for preparing the ion implanted specimens, H. Garvin and M. Braunstein for supplying the sputtered silicon specimens, E. Wolf for analyses with the scanning electron microscope, and A. Rabideau for technical assistance. We are indebted to J. W. Mayer, O. J. March, G. S. Picus, and R. Hart for many helpful discussions.|
|Usage Policy:||No commercial reproduction, distribution, display or performance rights in this work are provided.|
|Deposited By:||Tony Diaz|
|Deposited On:||11 Aug 2006|
|Last Modified:||26 Dec 2012 08:58|
Repository Staff Only: item control page