Chen, I-Chen and Chen, Li-Han and Ye, Xiang-Rong and Daraio, C. and Jin, Sungho and Orme, Christine A. and Quist, Arjan and Lal, Ratnesh (2006) Extremely sharp carbon nanocone probes for atomic force microscopy imaging. Applied Physics Letters, 88 (15). Art. No. 153102. ISSN 0003-6951 http://resolver.caltech.edu/CaltechAUTHORS:CHEapl06b
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A simple and reliable catalyst patterning technique combined with electric-field-guided growth is utilized to synthesize a sharp and high-aspect-ratio carbon nanocone probe on a tipless cantilever for atomic force microscopy. A single carbon nanodot produced by an electron-beam-induced deposition serves as a convenient chemical etch mask for catalyst patterning, thus eliminating the need for complicated, resist-based, electron-beam lithography for a nanoprobe fabrication. A gradual, sputtering-induced size reduction and eventual removal of the catalyst particle at the probe tip during electric-field-guided growth creates a sharp probe with a tip radius of only a few nanometers. These fabrication processes are amenable for the wafer-scale synthesis of multiple probes. High resolution imaging of three-dimensional features and deep trenches, and mechanical durability enabling continuous operation for many hours without noticeable image deterioration have been demonstrated.
|Additional Information:||©2006 American Institute of Physics (Received 25 October 2005; accepted 13 March 2006; published online 10 April 2006) The authors acknowledge the support of the work by NSF-NIRTs under Grant Nos. DMI-0210559 and DMI-0303790, UC Discovery Fund under Grant No. ele02-10133/Jin, Lawrence Livermore National Lab (LLNL) MRI Fund Contract No. 04-006, National Institute of General Medical Sciences (Contract No. GM056290), the Philip Morris External Grant Program, and Alzheimer's Disease Program of California Department of Health, U.S. Department of Energy by the University of California via Lawrence Livermore National Laboratory under Contract No. W-7405-Eng-4.|
|Subject Keywords:||carbon; nanostructured materials; atomic force microscopy; catalysts; electron beam deposition; masks; etching|
|Usage Policy:||No commercial reproduction, distribution, display or performance rights in this work are provided.|
|Deposited By:||Archive Administrator|
|Deposited On:||28 Sep 2006|
|Last Modified:||26 Dec 2012 09:03|
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