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Single-step deposition of high mobility graphene at reduced temperatures

Boyd, D. A. and Lin, W.-H. and Hsu, C.-C. and Teague, M. L. and Chen, C.-C. and Lo, Y.-Y. and Chan, W.-Y. and Su, W.-B. and Cheng, T.-C. and Chang, C.-S. and Wu, C.-I. and Yeh, N.-C. (2015) Single-step deposition of high mobility graphene at reduced temperatures. Nature Communications, 6 (3). Art. No. 6620. ISSN 2041-1723. http://resolver.caltech.edu/CaltechAUTHORS:20150209-143834331

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Abstract

Current methods of chemical vapour deposition (CVD) of graphene on ​copper are complicated by multiple processing steps and by high temperatures required in both preparing the ​copper and inducing subsequent film growth. Here we demonstrate a plasma-enhanced CVD chemistry that enables the entire process to take place in a single step, at reduced temperatures (<420 °C), and in a matter of minutes. Growth on ​copper foils is found to nucleate from arrays of well-aligned domains, and the ensuing films possess sub-nanometre smoothness, excellent crystalline quality, low strain, few defects and room-temperature electrical mobility up to (6.0±1.0) × 10^4 cm^2 V^(−1) s^(−1), better than that of large, single-crystalline graphene derived from thermal CVD growth. These results indicate that elevated temperatures and crystalline substrates are not necessary for synthesizing high-quality graphene.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1038/ncomms7620DOIArticle
http://www.nature.com/ncomms/2015/150318/ncomms7620/full/ncomms7620.htmlPublisherArticle
http://rdcu.be/clHDPublisherFree ReadCube access
http://www.nature.com/ncomms/2015/150318/ncomms7620/extref/ncomms7620-s1.pdfPublisherSupplementary Information
ORCID:
AuthorORCID
Yeh, N.-C.0000-0002-1826-419X
Additional Information:© 2015 Macmillan Publishers Limited. Received 7 June 2014. Accepted 11 February 2015. Published 18 March 2015. This work at Caltech was supported by National Science Foundation under the Institute of Quantum Information and Matter, and by Moore and Kavli Foundations through the Kavli Nanoscience Institute. The work in Taiwan was supported by the National Science Council under contracts 100-2911-I-002-514 and 101-2628-M-002-004. We thank Professor George Rossman for the use of his Raman spectrometer. D.A.B. specially thanks late Professor David G. Goodwin for his friendship and mentorship. D.A.B. conceived the PECVD-graphene growth idea. D.A.B., W.-H.L. and C.-C.H. developed the PECVD-graphene growth procedures and carried out Raman spectroscopic characterizations. C.-C.H. carried out SEM and atomic force microscopy studies on graphene samples. W.-H.L. processed the graphene FET devices and carried out the mobility measurements and analysis. Y.-Y.L, W.-B.S., C.-S.C. and M.L.T. performed the STM studies. T.-C. C. performed the XPS studies and analysis of the graphene samples. C.-I. Wu coordinated the device fabrication, mobility, XPS and part of the STM experiments. C.-C.C. and M.L.T. conducted the simulations and analysis of the STM data. N.-C.Y. coordinated with all co-authors on the design, planning and execution of the experiments, data analysis and simulations, and wrote the manuscript together with D.A.B. The authors declare no competing financial interests.
Group:IQIM, Institute for Quantum Information and Matter, Kavli Nanoscience Institute
Funders:
Funding AgencyGrant Number
NSFUNSPECIFIED
Institute for Quantum Information and Matter (IQIM)UNSPECIFIED
Gordon and Betty Moore FoundationUNSPECIFIED
Kavli FoundationUNSPECIFIED
Kavli Nanoscience InstituteUNSPECIFIED
National Science Council (Taipei)100-2911-I-002-514
National Science Council (Taipei)101-2628-M-002-004
Record Number:CaltechAUTHORS:20150209-143834331
Persistent URL:http://resolver.caltech.edu/CaltechAUTHORS:20150209-143834331
Official Citation:Boyd, D. A. et al. Single-step deposition of high-mobility graphene at reduced temperatures. Nat. Commun. 6:6620 doi: 10.1038/ncomms7620 (2015).
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:54580
Collection:CaltechAUTHORS
Deposited By: George Porter
Deposited On:18 Mar 2015 15:18
Last Modified:14 Sep 2017 22:26

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