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Soft lithography molding of polymer integrated optical devices: Reduction of the background residue

Paloczi, George T. and Huang, Yanyi and Scheuer, Jacob and Yariv, Amnon (2004) Soft lithography molding of polymer integrated optical devices: Reduction of the background residue. Journal of Vacuum Science and Technology B, 22 (4). pp. 1764-1769. ISSN 1071-1023. http://resolver.caltech.edu/CaltechAUTHORS:PALjvstb04

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Abstract

Soft lithography molding is a promising technique for patterning polymer integrated optical devices, however the presence of a background residue has the potential to limit the usefulness of this technique. We present the soft lithography technique for fabricating polymer waveguides. Several effects of the background residue are investigated numerically, including the modal properties of an individual waveguide, the coupling ratio of a directional coupler, and the radiation loss in a waveguide bend. Experimentally, the residue is found to be reduced through dilution of the core polymer solution. We find that the force with which the soft mold is depressed on the substrate does not appreciably affect the waveguide thickness or the residue thickness. Optical microscope images show that the residue is thinnest next to the waveguide.


Item Type:Article
Additional Information:©2004 American Vacuum Society. (Received 12 March 2004; accepted 10 May 2004; published 14 July 2004)
Subject Keywords:optical directional couplers; nanolithography; integrated optics; optical waveguides; pattern formation
Record Number:CaltechAUTHORS:PALjvstb04
Persistent URL:http://resolver.caltech.edu/CaltechAUTHORS:PALjvstb04
Alternative URL:http://dx.doi.org/10.1116/1.1767827
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:5661
Collection:CaltechAUTHORS
Deposited By: Archive Administrator
Deposited On:27 Oct 2006
Last Modified:26 Dec 2012 09:14

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