Paloczi, George T. and Huang, Yanyi and Scheuer, Jacob and Yariv, Amnon (2004) Soft lithography molding of polymer integrated optical devices: Reduction of the background residue. Journal of Vacuum Science and Technology B, 22 (4). pp. 1764-1769. ISSN 1071-1023. http://resolver.caltech.edu/CaltechAUTHORS:PALjvstb04
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Soft lithography molding is a promising technique for patterning polymer integrated optical devices, however the presence of a background residue has the potential to limit the usefulness of this technique. We present the soft lithography technique for fabricating polymer waveguides. Several effects of the background residue are investigated numerically, including the modal properties of an individual waveguide, the coupling ratio of a directional coupler, and the radiation loss in a waveguide bend. Experimentally, the residue is found to be reduced through dilution of the core polymer solution. We find that the force with which the soft mold is depressed on the substrate does not appreciably affect the waveguide thickness or the residue thickness. Optical microscope images show that the residue is thinnest next to the waveguide.
|Additional Information:||©2004 American Vacuum Society. (Received 12 March 2004; accepted 10 May 2004; published 14 July 2004)|
|Subject Keywords:||optical directional couplers; nanolithography; integrated optics; optical waveguides; pattern formation|
|Usage Policy:||No commercial reproduction, distribution, display or performance rights in this work are provided.|
|Deposited By:||Archive Administrator|
|Deposited On:||27 Oct 2006|
|Last Modified:||26 Dec 2012 09:14|
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