Xiong, Fulin and Tombrello, T. A. and Wang, H. and Chen, T. R. and Chen, H. Z. and Morkoç, H. and Yariv, A. (1989) High efficiency single quantum well graded-index separate-confinement heterostructure lasers fabricated with MeV oxygen ion implantation. Applied Physics Letters, 54 (8). pp. 730-732. ISSN 0003-6951 http://resolver.caltech.edu/CaltechAUTHORS:XIOapl89
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Single quantum well AlGaAs/GaAs graded-index separate-confinement heterostructure lasers have been fabricated using MeV oxygen ion implantation plus optimized subsequent thermal annealing. A high differential quantum efficiency of 85% has been obtained in a 360-µm-long and 10-µm-wide stripe geometry device. The results have also demonstrated that excellent electrical isolation (breakdown voltage of over 30 V) and low threshold currents (22 mA) can be obtained with MeV oxygen ion isolation. It is suggested that oxygen ion implantation induced selective carrier compensation and compositional disordering in the quantum well region as well as radiation-induced lattice disordering in AlxGa1–xAs/GaAs may be mostly responsible for the buried layer modification in this fabrication process.
|Additional Information:||© 1989 American Institute of Physics (Received 26 September 1988; accepted 6 December 1988) The authors wish to express their gratitude to M. Mittlstein for his assistance in the measurements. This work was supported in part by the National Science Foundation (DMR86-15641) and the Office of Naval Research (contract No. N00014-85-K-0032).|
|Subject Keywords:||QUANTUM EFFICIENCY; HETEROJUNCTIONS; FABRICATION; EXPERIMENTAL DATA; BREAKDOWN; ION IMPLANTATION; MEV RANGE; OXYGEN IONS; THRESHOLD CURRENT; ALUMINIUM ARSENIDES; GALLIUM ARSENIDES; ANNEALING; OPERATION; PERFORMANCE; SEMICONDUCTOR LASERS; HETEROJUNCTIONS; QUANTUM WELL STRUCTURES|
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|Deposited On:||27 Oct 2006|
|Last Modified:||26 Dec 2012 09:14|
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