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Laser annealing of silicon on sapphire

Roulet, M. E. and Schwob, P. and Affolter, K. and Lüthy, W. and von Allmen, M. and Fallavier, M. and Mackowski, J. M. and Nicolet, M. A. and Thomas, J. P. (1979) Laser annealing of silicon on sapphire. Journal of Applied Physics, 50 (8). pp. 5536-5538. ISSN 0021-8979. http://resolver.caltech.edu/CaltechAUTHORS:ROUjap79

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Abstract

Silicon-implanted silicon-on-sapphire wafers have been annealed by 50-ns pulses from a Q-switched Nd : YAG laser. The samples have been analyzed by channeling and by omega-scan x-ray double diffraction. After irradiation with pulses of a fluence of about 5 J cm^–2 the crystalline quality of the silicon layer is found to be better than in the as-grown state.


Item Type:Article
Additional Information:Copyright © 1979 American Institute of Physics Received 5 December 1978; accepted for publication 6 February 1979 The authors would like to thank Dr. H. Luginbühl of CEH for the ion implantation, L. Simmen, R. Kirsch, and the Atomic Collision Group of the IPn, Lyon, for technical assistance, and Dr. G. Rolland of LETI, Grenbole, for the x-ray double diffraction measurements. One of the authors (M.E.R.) is grateful to Professor W. G. Spitzer of the University of Southern California for helpful discussion on optical properties of implanted silicon. The authors from IAP, Berne, are grateful to Professor H. P. Weber for his stimulating interest in this work.
Subject Keywords:SILICON; SAPPHIRE; LASER–RADIATION HEATING; ANNEALING; PULSES; Q–SWITCHING; NEODYMIUM LASERS; X–RAY DIFFRACTION; CRYSTALS; LAYERS
Record Number:CaltechAUTHORS:ROUjap79
Persistent URL:http://resolver.caltech.edu/CaltechAUTHORS:ROUjap79
Alternative URL:http://dx.doi.org/10.1063/1.326616
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:5757
Collection:CaltechAUTHORS
Deposited By: Archive Administrator
Deposited On:01 Nov 2006
Last Modified:26 Dec 2012 09:14

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