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Linearity and enhanced sensitivity of the Shipley AZ-1350B photoresist

Livanos, A. C. and Katzir, A. and Shellan, J. B. and Yariv, A. (1977) Linearity and enhanced sensitivity of the Shipley AZ-1350B photoresist. Applied Optics, 16 (6). pp. 1633-1635. ISSN 0003-6935. http://resolver.caltech.edu/CaltechAUTHORS:LIVao77

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Abstract

The properties of the Shipley AZ-1350B positive photoresist used with the Shipley AZ-303A developer were investigated. It was found that the use of AZ-303A developer results in a significant improvement of the sensitivity and the linearity of the photoresist. The unexposed etch rate of the photoresist was 35 Å ± 5 Å/sec. Gratings of high efficiency have been successfully fabricated using the above combination of photoresist and developer.


Item Type:Article
Additional Information:© Copyright 1977 Optical Society of America Received 27 November 1976. The authors thank D. R. Armstrong for his valuable technical assistance. This research was supported by the U.S. Air Force Office of Scientific Research. The work of J. B. Shellan is supported in part by the Hertz Foundation.
Record Number:CaltechAUTHORS:LIVao77
Persistent URL:http://resolver.caltech.edu/CaltechAUTHORS:LIVao77
Alternative URL:http://www.opticsinfobase.org/abstract.cfm?URI=ao-16-6-1633
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:5910
Collection:CaltechAUTHORS
Deposited By: Archive Administrator
Deposited On:08 Nov 2006
Last Modified:26 Dec 2012 09:16

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