Dial, O. and Cheng, C. C. and Scherer, A. (1998) Fabrication of high-density nanostructures by electron beam lithography. Journal of Vacuum Science and Technology B, 16 (6). pp. 3887-3890. ISSN 1071-1023. http://resolver.caltech.edu/CaltechAUTHORS:DIAjvstb98
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We demonstrate a fabrication method to define high-density, uniform nanostructures by electron beam lithography at conventional beam voltages (< 40 kV). Here we optimize the exposure and development conditions needed to generate such nanostructure arrays using polymethylmethacrylate as positive resist and isopropyl alcohol as a developer. Arrays of 12 nm dots with 25 nm period and 20 nm lines with 40 nm period were fabricated to show the resolution of this optimized process.
|Additional Information:||©1998 American Vacuum Society. (Received 29 May 1998; accepted 29 September 1998) This work was supported by the Army Research Office and the National Science Foundation, which are gratefully acknowledged.|
|Subject Keywords:||electron beam lithography; nanotechnology|
|Usage Policy:||No commercial reproduction, distribution, display or performance rights in this work are provided.|
|Deposited By:||Archive Administrator|
|Deposited On:||09 Nov 2006|
|Last Modified:||26 Dec 2012 09:16|
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