Brewer, R. T. and Atwater, Harry A. and Groves, J. R. and Arendt, P. N. (2003) Reflection high-energy electron diffraction experimental analysis of polycrystalline MgO films with grain size and orientation distributions. Journal of Applied Physics, 93 (1). pp. 205-210. ISSN 0021-8979 http://resolver.caltech.edu/CaltechAUTHORS:BREjap03
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Analysis of biaxial texture of MgO films grown by ion-beam-assisted deposition (IBAD) has been performed using a quantitative reflection high-energy electron diffraction (RHEED) based method. MgO biaxial texture is determined by analysis of diffraction spot shapes from single RHEED images, and by measuring the width of RHEED in-plane rocking curves for MgO films grown on amorphous Si3N4 by IBAD using 750 eV Ar+ ions, at 45° incidence angle, and MgO e-beam evaporation. RHEED-based biaxial texture measurement accuracy is verified by comparison with in-plane and out-of-plane orientation distribution measurements made using transmission electron microscopy and x-ray rocking curves. In situ RHEED measurements also enable the analysis of the evolution of the biaxial texture which narrows with increasing film thickness. RHEED-based measurements of IBAD MgO biaxial texture show that the minimum in-plane orientation distribution depends on the out-of-plane orientation distribution, and indicates that the minimum obtainable in-plane orientation on distribution is 2°.
|Additional Information:||©2003 American Institute of Physics. Received: 16 July 2002; accepted: 11 October 2002. The authors would like to thank J.F. Whitacre and P. Zschack for assistance with synchrotron measurements, as well as L. Emmert and P.C. Yashar for grazing incidence XRD measurements of IBAD MgO in-plane orientation distribution. This work was supported by the DARPA VIP III program and ARO MURI Grant No. DAAD19-01-1-0517. Use of the APS synchrotron was supported by the U.S. Department of Energy, Office of Science, Office of Basic Energy Sciences, under Contract No. W-31-109-Eng-38.|
|Subject Keywords:||magnesium compounds; reflection high energy electron diffraction; thin films; ion beam assisted deposition; texture; grain size|
|Usage Policy:||No commercial reproduction, distribution, display or performance rights in this work are provided.|
|Deposited By:||Lindsay Cleary|
|Deposited On:||15 Dec 2006|
|Last Modified:||26 Dec 2012 09:23|
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