Garvin, Hugh L. and Garmire, E. and Somekh, S. and Stoll, H. and Yariv, A. (1973) Ion beam micromachining of integrated optics components. Applied Optics, 12 (3). pp. 455-459. ISSN 0003-6935 http://resolver.caltech.edu/CaltechAUTHORS:GARao73
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Thin film integrated optics components such as light guides, modulators, directional couplers, and polarizers demand high quality edge smoothness and high resolution pattern formation in dimensions down to submicrometer size. Fabrication techniques combining holographic and scanning electron beam lithography with ion beam micromachining have produced planar phase gratings with intervals as small as 2800 Å, guiding channel couplers in GaAs, and also wire- grid polarizers for 10.6-µm radiation.
|Additional Information:||© Copyright 1973 Optical Society of America Received 7 September 1972. The authors wish to express their gratitude to J. R. Devaney and K. C. Evans at the Jet Propulsion Laboratory for the scanning electron microscope photographs shown in Figs. 4, 5(b), and 6(a) and (b). We also wish to express our appreciation to E. D. Wolf and W. E. Perkins of the Hughes Research Laboratories for the electron lithography work leading to Fig. 2, and to P. J. Coane for the scanning electron micrograph shown in Fig. 5(a).|
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|Deposited On:||16 Dec 2006|
|Last Modified:||26 Dec 2012 09:23|
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