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Ab initio evidence for the formation of impurity d3z2-r2 holes in doped La2-xSrxCuO4

Perry, Jason K. and Tahir-Kheli, Jamil and Goddard, William A., III (2002) Ab initio evidence for the formation of impurity d3z2-r2 holes in doped La2-xSrxCuO4. Physical Review B, 65 (14). Art. No. 144501. ISSN 0163-1829. http://resolver.caltech.edu/CaltechAUTHORS:PERprb02

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Abstract

Using the spin unrestricted Becke-3-Lee-Yang-Parr density functional, we computed the electronic structure of explicitly doped La2-xSrxCuO4 (x=0.125, 0.25, and 0.5). At each doping level, an impurity hole band is formed within the undoped insulating gap. This band is well localized to CuO6 octahedra adjacent to the Sr impurities. The nature of the impurity hole is A1g in symmetry, formed primarily from the z2 orbital on the Cu and pz orbitals on the apical O’s. There is a strong triplet coupling of this hole with the intrinsic B1g Cu x2-y2/O1 pσ hole on the same site. Optimization of the c coordinate of the apical O’s in the doped CuO6 octahedron leads to an asymmetric anti-Jahn-Teller distortion of the O2 atoms toward the central Cu. In particular, the O2 atom between the Cu and Sr is displaced 0.26 Å while the O2 atom between the Cu and La is displaced 0.10 Å. Contrary to expectations, investigation of a 0.1 Å enhanced Jahn-Teller distortion of this octahedron does not force formation of an x2-y2 hole, but instead leads to migration of the z2 hole to the four other CuO6 octahedra surrounding the Sr impurity. This latter observation offers a simple explanation for the bifurcation of the Sr-O2 distance revealed in x-ray absorption fine structure data.


Item Type:Article
Additional Information:©2002 The American Physical Society Received 14 November 2001; published 8 March 2002 We wish to acknowledge helpful discussions with Dr. Daniel Haskel and Dr. Peter Schultz. This work was partially supported by the Materials and Process Simulation Center ~MSC! at Caltech which is supported by grants from DOE-ASCI, ARO/DURIP, ARO/MURI, 3M, Beckman Institute, Seiko-Epson, Dow, Avery-Dennison, Kellogg, and Asahi Chemical.
Record Number:CaltechAUTHORS:PERprb02
Persistent URL:http://resolver.caltech.edu/CaltechAUTHORS:PERprb02
Alternative URL:http://dx.doi.org/10.1103/PhysRevB.65.144501
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:8451
Collection:CaltechAUTHORS
Deposited By: Archive Administrator
Deposited On:14 Aug 2007
Last Modified:26 Dec 2012 09:39

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