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The role of particle energy and pulsed particle flux in physical vapor deposition and pulsed–laser deposition

Mayr, Stefan G. and Moske, Michael and Samwer, Konrad and Taylor, Maggie E. and Atwater, Harry A. (1999) The role of particle energy and pulsed particle flux in physical vapor deposition and pulsed–laser deposition. Applied Physics Letters, 75 (26). pp. 4091-4093. ISSN 0003-6951. http://resolver.caltech.edu/CaltechAUTHORS:MAYapl99

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Abstract

Surface morphology evolution of thin films generated by physical and pulsed-laser deposition depending on the incident particle energy and the pulse rate is investigated using a continuum growth model. The model includes curvature-induced surface diffusion, the Schwoebel barrier and surface atom displacement as main surface processes. The numerical solution of the model is in very good agreement with the results of kinetic Monte Carlo simulations, which also serve to estimate the continuum growth parameters, and with experimental results on thin Si films. The increase of the incident particle energy, starting from thermal energy, fundamentally influences the surface topography, changing from self-affine to self-organized morphology.


Item Type:Article
Additional Information:©1999 American Institute of Physics. (Received 9 June 1999; accepted 3 November 1999) Financial support by the DFG–Sonderforschungsbereich 438 München-Augsburg, TP A1 and the National Science Foundation is gratefully acknowledged.
Subject Keywords:vapour deposition; pulsed laser deposition; surface structure; surface diffusion; surface topography; thin films
Record Number:CaltechAUTHORS:MAYapl99
Persistent URL:http://resolver.caltech.edu/CaltechAUTHORS:MAYapl99
Alternative URL:http://dx.doi.org/10.1063/1.125546
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:8548
Collection:CaltechAUTHORS
Deposited By: Archive Administrator
Deposited On:19 Aug 2007
Last Modified:26 Dec 2012 09:40

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