Meng, W. J. and Nieh, C. W. and Johnson, W. L. (1987) Maximum thickness of amorphous NiZr interlayers formed by a solid-state reaction technique. Applied Physics Letters, 51 (21). pp. 1693-1695. ISSN 0003-6951 http://resolver.caltech.edu/CaltechAUTHORS:MENapl87b
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Abstract
Formation of the equilibrium intermetallic compound NiZr in sputter deposited Ni/Zr diffusion couples is suppressed by the formation of a metastable amorphous NiZr alloy until a critical thickness of the amorphous NiZr interlayer is reached. The temperature dependence of this critical thickness is studied experimentally. A phenomenological model based on the premise of interfacial heterogeneous nucleation is proposed to understand the evolution of Ni/Zr diffusion couples.
| Item Type: | Article |
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| Additional Information: | © 1987 American Institute of Physics. Received 16 July 1987; accepted 28 September 1987. Technical assistance by C. Garland and C. Ahn is gratefully acknowledged. This work was supported by the U.S. Department of Energy, through contract No. DE-FG03-86ER45242. We thank E.J. Cotts and K. Samwer for helpful discussions. |
| Record Number: | CaltechAUTHORS:MENapl87b |
| Persistent URL: | http://resolver.caltech.edu/CaltechAUTHORS:MENapl87b |
| Alternative URL: | http://dx.doi.org/10.1063/1.98546 |
| Usage Policy: | No commercial reproduction, distribution, display or performance rights in this work are provided. |
| ID Code: | 9883 |
| Collection: | CaltechAUTHORS |
| Deposited By: | Tony Diaz |
| Deposited On: | 26 Mar 2008 |
| Last Modified: | 26 Dec 2012 09:53 |
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