CaltechAUTHORS
  A Caltech Library Service

Maximum thickness of amorphous NiZr interlayers formed by a solid-state reaction technique

Meng, W. J. and Nieh, C. W. and Johnson, W. L. (1987) Maximum thickness of amorphous NiZr interlayers formed by a solid-state reaction technique. Applied Physics Letters, 51 (21). pp. 1693-1695. ISSN 0003-6951. http://resolver.caltech.edu/CaltechAUTHORS:MENapl87b

[img]
Preview
PDF
See Usage Policy.

859Kb

Use this Persistent URL to link to this item: http://resolver.caltech.edu/CaltechAUTHORS:MENapl87b

Abstract

Formation of the equilibrium intermetallic compound NiZr in sputter deposited Ni/Zr diffusion couples is suppressed by the formation of a metastable amorphous NiZr alloy until a critical thickness of the amorphous NiZr interlayer is reached. The temperature dependence of this critical thickness is studied experimentally. A phenomenological model based on the premise of interfacial heterogeneous nucleation is proposed to understand the evolution of Ni/Zr diffusion couples.


Item Type:Article
Additional Information:© 1987 American Institute of Physics. Received 16 July 1987; accepted 28 September 1987. Technical assistance by C. Garland and C. Ahn is gratefully acknowledged. This work was supported by the U.S. Department of Energy, through contract No. DE-FG03-86ER45242. We thank E.J. Cotts and K. Samwer for helpful discussions.
Record Number:CaltechAUTHORS:MENapl87b
Persistent URL:http://resolver.caltech.edu/CaltechAUTHORS:MENapl87b
Alternative URL:http://dx.doi.org/10.1063/1.98546
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:9883
Collection:CaltechAUTHORS
Deposited By: Tony Diaz
Deposited On:26 Mar 2008
Last Modified:26 Dec 2012 09:53

Repository Staff Only: item control page