Meng, W. J. and Nieh, C. W. and Johnson, W. L. (1987) Maximum thickness of amorphous NiZr interlayers formed by a solid-state reaction technique. Applied Physics Letters, 51 (21). pp. 1693-1695. ISSN 0003-6951 http://resolver.caltech.edu/CaltechAUTHORS:MENapl87b
See Usage Policy.
Use this Persistent URL to link to this item: http://resolver.caltech.edu/CaltechAUTHORS:MENapl87b
Formation of the equilibrium intermetallic compound NiZr in sputter deposited Ni/Zr diffusion couples is suppressed by the formation of a metastable amorphous NiZr alloy until a critical thickness of the amorphous NiZr interlayer is reached. The temperature dependence of this critical thickness is studied experimentally. A phenomenological model based on the premise of interfacial heterogeneous nucleation is proposed to understand the evolution of Ni/Zr diffusion couples.
|Additional Information:||© 1987 American Institute of Physics. Received 16 July 1987; accepted 28 September 1987. Technical assistance by C. Garland and C. Ahn is gratefully acknowledged. This work was supported by the U.S. Department of Energy, through contract No. DE-FG03-86ER45242. We thank E.J. Cotts and K. Samwer for helpful discussions.|
|Usage Policy:||No commercial reproduction, distribution, display or performance rights in this work are provided.|
|Deposited By:||Tony Diaz|
|Deposited On:||26 Mar 2008|
|Last Modified:||26 Dec 2012 09:53|
Repository Staff Only: item control page