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Henry, M. D. and Shearn, M. J. and Chhim, B. et al. (2010) Ga^+ beam lithography for nanoscale silicon reactive ion etching. Nanotechnology, 21 (24). Art. No. 245303 . ISSN 0957-4484. http://resolver.caltech.edu/CaltechAUTHORS:20100615-145746511

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