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Henry, M. David and Shearn, Michael and Scherer, Axel (2010) Ga+ beam lithography for suspended lateral beams and nanowires. Journal of Vacuum Science and Technology B, 28 (6). C6F26-C6F30. ISSN 1071-1023. http://resolver.caltech.edu/CaltechAUTHORS:20110315-095855621

This list was generated on Sun Sep 24 03:03:58 2017 PDT.