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Kittl, J. A. and Nieh, C. W. and Lee, D. S. et al. (1990) Correlations between deposition parameters and structural and electrical properties of YBa2Cu3O7–delta thin films grown in situ by sequential ion beam sputtering. Applied Physics Letters, 56 (24). pp. 2468-2470. ISSN 0003-6951. http://resolver.caltech.edu/CaltechAUTHORS:KITapl90

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