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Giapis, Konstantinos P. and Scheller, Geoffrey R. and Gottscho, Richard A. et al. (1990) Microscopic and macroscopic uniformity control in plasma etching. Applied Physics Letters, 57 (10). pp. 983-985. ISSN 0003-6951.

This list was generated on Fri Mar 24 15:04:04 2017 PDT.