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Modifications of ion beam sputtered tantala thin films by secondary argon and oxygen bombardment

Yang, Le and Randel, Emmett and Vajente, Gabriele and Ananyeva, Alena and Gustafson, Eric and Markosyan, Ashot and Bassiri, Riccardo and Fejer, Martin and Menoni, Carmen (2020) Modifications of ion beam sputtered tantala thin films by secondary argon and oxygen bombardment. Applied Optics, 59 (5). A150-A154. ISSN 1559-128X. https://resolver.caltech.edu/CaltechAUTHORS:20200430-123125903

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Abstract

Amorphous tantala (Ta₂O₅) thin films were deposited by reactive ion beam sputtering with simultaneous low energy assist Ar⁺ or Ar⁺/O₂⁺ bombardment. Under the conditions of the experiment, the as-deposited thin films are amorphous and stoichiometric. The refractive index and optical band gap of thin films remain unchanged by ion bombardment. Around 20% improvement in room temperature mechanical loss and 60% decrease in absorption loss are found in samples bombarded with 100-eV Ar⁺. A detrimental influence from low energy O₂⁺ bombardment on absorption loss and mechanical loss is observed. Low energy Ar⁺ bombardment removes excess oxygen point defects, while O₂⁺ bombardment introduces defects into the tantala films.


Item Type:Article
Related URLs:
URLURL TypeDescription
https://doi.org/10.1364/ao.59.00a150DOIArticle
ORCID:
AuthorORCID
Yang, Le0000-0002-8868-5977
Vajente, Gabriele0000-0002-7656-6882
Fejer, Martin0000-0002-5512-1905
Menoni, Carmen0000-0001-9185-2572
Additional Information:© 2020 Optical Society of America. Received 17 September 2019; revised 19 November 2019; accepted 3 December 2019; posted 3 December 2019 (Doc. ID 377788); published 14 January 2020. Portions of this work were presented at the Optical Interference Coatings Conference in 2019, FA.6 “Optical properties and mechanical loss of amorphous Ta₂O₅ thin films bombarded with low energy assist ions.” Funding: LIGO program, National Science Foundation (1710957). The authors declare no conflicts of interest.
Group:LIGO
Funders:
Funding AgencyGrant Number
NSFPHY-1710957
Issue or Number:5
Record Number:CaltechAUTHORS:20200430-123125903
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:20200430-123125903
Official Citation:Le Yang, Emmett Randel, Gabriele Vajente, Alena Ananyeva, Eric Gustafson, Ashot Markosyan, Riccardo Bassiri, Martin Fejer, and Carmen Menoni, "Modifications of ion beam sputtered tantala thin films by secondary argon and oxygen bombardment," Appl. Opt. 59, A150-A154 (2020)
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:102931
Collection:CaltechAUTHORS
Deposited By: Tony Diaz
Deposited On:30 Apr 2020 20:38
Last Modified:30 Apr 2020 20:38

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