CaltechAUTHORS
  A Caltech Library Service

Removal of Antibiotic Resistant Bacteria and Genes by UV-Assisted Electrochemical Oxidation on Degenerative TiO₂ Nanotube Arrays

Wang, Siwen and Yang, Shasha and Quispe, Estefanny and Yang, Hannah and Sanfiorenzo, Charles and Rogers, Shane W. and Wang, Kaihang and Yang, Yang and Hoffmann, Michael R. (2021) Removal of Antibiotic Resistant Bacteria and Genes by UV-Assisted Electrochemical Oxidation on Degenerative TiO₂ Nanotube Arrays. ACS ES&T Engineering, 1 (3). pp. 612-622. ISSN 2690-0645. doi:10.1021/acsestengg.1c00011. https://resolver.caltech.edu/CaltechAUTHORS:20210303-073747741

[img] PDF - Supplemental Material
See Usage Policy.

880kB

Use this Persistent URL to link to this item: https://resolver.caltech.edu/CaltechAUTHORS:20210303-073747741

Abstract

Antibiotic resistance has become a global crisis in recent years, while wastewater treatment plants (WWTPs) have been identified as a significant source of both antibiotic resistant bacteria (ARB) and antibiotic resistance genes (ARGs). However, commonly used disinfectants have been shown to be ineffective for the elimination of ARGs. With the goal of upgrading the conventional UV disinfection unit with stronger capability to combat ARB and ARGs, we developed a UV-assisted electrochemical oxidation (UV-EO) process that employs blue TiO₂ nanotube arrays (BNTAs) as photoanodes. Inactivation of tetracycline- and sulfamethoxazole-resistant E. coli along with degradation of the corresponding plasmid coded genes (tetA and sul1) is measured by plate counting on selective agar and qPCR, respectively. In comparison with UV₂₅₄ irradiation alone, enhanced ARB inactivation and ARG degradation is achieved by UV-EO. Chloride significantly promotes the inactivation efficiency due to the electrochemical production of free chlorine and the subsequent UV/chlorine photoreactions. The fluence-based first-order kinetic rate coefficients of UV-EO in Cl⁻ are larger than those of UV₂₅₄ irradiation alone by a factor of 2.1–2.3 and 1.3–1.8 for the long and short target genes, respectively. The mechanism of plasmid DNA damage by different radical species is further explored using gel electrophoresis and computational kinetic modeling. The process can effectively eliminate ARB and ARGs in latrine wastewater, though the kinetics were retarded.


Item Type:Article
Related URLs:
URLURL TypeDescription
https://doi.org/10.1021/acsestengg.1c00011DOIArticle
ORCID:
AuthorORCID
Wang, Siwen0000-0002-8553-425X
Yang, Shasha0000-0002-6646-5332
Quispe, Estefanny0000-0003-3102-6177
Rogers, Shane W.0000-0003-4488-5122
Wang, Kaihang0000-0001-7657-8755
Yang, Yang0000-0003-3767-8029
Hoffmann, Michael R.0000-0001-6495-1946
Alternate Title:Removal of Antibiotic Resistant Bacteria and Genes by UV-Assisted Electrochemical Oxidation on Degenerative TiO2 Nanotube Arrays
Additional Information:© 2021 American Chemical Society. Received: January 8, 2021; Revised: February 8, 2021; Accepted: February 9, 2021. This research was supported by the Bill and Melinda Gates Foundation, Seattle, WA [BMGF INV-003227]. The authors acknowledge Professor Stefan Grimberg and Xudong Su for their kindest help with the experimental setup at Clarkson University. We also thank Dr. Clément Cid and Nissim Gore-Datar for their help with the sampling of the latrine wastewater. The authors declare no competing financial interest.
Funders:
Funding AgencyGrant Number
Bill and Melinda Gates FoundationBMGF INV-003227
Subject Keywords:Antibiotic resistant bacteria, Antibiotic resistance genes, UV-assisted electrochemical oxidation (UV-EO), Blue TiO₂ nanotube arrays (BNTAs), Wastewater treatment
Issue or Number:3
DOI:10.1021/acsestengg.1c00011
Record Number:CaltechAUTHORS:20210303-073747741
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:20210303-073747741
Official Citation:Removal of Antibiotic Resistant Bacteria and Genes by UV-Assisted Electrochemical Oxidation on Degenerative TiO2 Nanotube Arrays. Siwen Wang, Shasha Yang, Estefanny Quispe, Hannah Yang, Charles Sanfiorenzo, Shane W. Rogers, Kaihang Wang, Yang Yang, and Michael R. Hoffmann. ACS ES&T Engineering 2021 1 (3), 612-622; DOI: 10.1021/acsestengg.1c00011
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:108283
Collection:CaltechAUTHORS
Deposited By: Tony Diaz
Deposited On:03 Mar 2021 18:46
Last Modified:05 Apr 2021 14:45

Repository Staff Only: item control page