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Two-dimensional extreme skin depth engineering for CMOS photonics

van Niekerk, Matthew and Jahani, Saman and Bickford, Justin and Cho, Pak and Anderson, Stephen and Leake, Gerald and Coleman, Daniel and Fanto, Michael L. and Tison, Christopher C. and Howland, Gregory A. and Jacob, Zubin and Preble, Stefan F. (2021) Two-dimensional extreme skin depth engineering for CMOS photonics. Journal of the Optical Society of America B, 38 (4). pp. 1307-1316. ISSN 0740-3224. doi:10.1364/josab.416848. https://resolver.caltech.edu/CaltechAUTHORS:20210429-132054258

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Abstract

Extreme skin depth engineering (e-skid) can be applied to integrated photonics to manipulate the evanescent field of a waveguide. Here we demonstrate that e-skid can be implemented in two directions in order to deterministically engineer the evanescent wave allowing for dense integration with enhanced functionalities. In particular, by increasing the skin depth, we enable the creation of two-dimensional (2D) e-skid directional couplers with large gaps and operational bandwidth. Here we experimentally validate 2D e-skid for integrated photonics in a complementary metal–oxide semiconductor (CMOS) photonics foundry and demonstrate strong coupling with a gap of 1.44 µm.


Item Type:Article
Related URLs:
URLURL TypeDescription
https://doi.org/10.1364/josab.416848DOIArticle
https://arxiv.org/abs/2005.14265arXivDiscussion Paper
ORCID:
AuthorORCID
Jahani, Saman0000-0003-4831-2276
Jacob, Zubin0000-0002-5602-1412
Additional Information:©2021 Optical Society of America under the terms of the OSA Open Access Publishing Agreement. Received 7 December 2020; revised 24 February 2021; accepted 27 February 2021; posted 2 March 2021 (Doc. ID 416848); published 24 March 2021. Funding: National Science Foundation (1810282); Air Force Research Laboratory (FA8650-15-2-5220, FA8750-16-2-0140). Any opinions, findings, and conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. The views and conclusions contained herein are those of the authors and should not be interpreted as necessarily representing the official policies or endorsements, either expressed or implied, of Air Force Research Laboratory or the U.S. Government. M. v. N. and S. F. P. would like to acknowledge Navin B. Lingaraju for sparking a collaboration between RIT and Purdue. The authors declare that there are no conflicts of interest related to this article.
Funders:
Funding AgencyGrant Number
NSFECCS-1810282
Air Force Research LaboratoryFA8650-15-2-5220
Air Force Research LaboratoryFA8750-16-2-0140
Issue or Number:4
DOI:10.1364/josab.416848
Record Number:CaltechAUTHORS:20210429-132054258
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:20210429-132054258
Official Citation:Matthew van Niekerk, Saman Jahani, Justin Bickford, Pak Cho, Stephen Anderson, Gerald Leake, Daniel Coleman, Michael L. Fanto, Christopher C. Tison, Gregory A. Howland, Zubin Jacob, and Stefan F. Preble, "Two-dimensional extreme skin depth engineering for CMOS photonics," J. Opt. Soc. Am. B 38, 1307-1316 (2021)
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:108876
Collection:CaltechAUTHORS
Deposited By: George Porter
Deposited On:29 Apr 2021 21:09
Last Modified:30 Apr 2021 17:37

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