Rodriguez, V. and Nicolet, M-A. (1969) Drift velocity of electrons in silicon at high electric fields from 4.2° to 300°K. Journal of Applied Physics, 40 (2). pp. 496-498. ISSN 0021-8979. https://resolver.caltech.edu/CaltechAUTHORS:RODjap69
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Abstract
The drift velocity of electrons in silicon at high electric fields is measured in the <111> direction over the range of lattice temperatures from 4.2° to 300°K. It is established that in this range a limiting drift velocity exists. Its temperature dependence is measured. The samples used and the method of measurement are briefly described.
| Item Type: | Article | ||||||
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| Additional Information: | ©1969 The American Institute of Physics. Received 9 September 1968. The structures were manufactured with the research facilities of Fairchild Semiconductor, Palo Alto. We thank C.A. Bittmann for making this possible. We also acknowledge the financial support of Fairchild Camera and Instrument, and the Naval Ordnance Test Station, Pasadena Annex. | ||||||
| Issue or Number: | 2 | ||||||
| Record Number: | CaltechAUTHORS:RODjap69 | ||||||
| Persistent URL: | https://resolver.caltech.edu/CaltechAUTHORS:RODjap69 | ||||||
| Usage Policy: | No commercial reproduction, distribution, display or performance rights in this work are provided. | ||||||
| ID Code: | 11059 | ||||||
| Collection: | CaltechAUTHORS | ||||||
| Deposited By: | Tony Diaz | ||||||
| Deposited On: | 26 Jun 2008 | ||||||
| Last Modified: | 03 Oct 2019 00:15 |
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