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3D Porous Graphene Films with Large‐Area In‐Plane Exterior Skins

Tay, Roland Yingjie and Li, Hongling and Ng, Zhi Kai and Tsang, Siu Hon and Gao, Wei and Teo, Edwin Hang Tong (2022) 3D Porous Graphene Films with Large‐Area In‐Plane Exterior Skins. Advanced Materials Interfaces, 9 (6). Art. No. 2101938. ISSN 2196-7350. doi:10.1002/admi.202101938. https://resolver.caltech.edu/CaltechAUTHORS:20220202-544220000

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Abstract

Construction of macroscopic 3D architectures of graphene is crucial to harness the advantageous properties of planar 2D graphene and to enable integration to many conventional and novel applications. Ideally, the 3D structure of graphene should be free of defects, covalently interconnected, and can be produced at large-scale. Among various assembly techniques, fabrication using chemical vapor deposition (CVD) enables the production of high-quality graphene where selection of template is the key that determines its consequent crystalline quality and structural morphology. Herein, a new method is presented to synthesize high-quality porous graphene film by incorporating an in situ reduction–oxidation cycling treatment to generate micrometer-sized pores on commercial Ni foil using an all-CVD process route. Owing to the unique morphological features of the modified Ni template, the graphene film exhibits a holey surface with large-area exterior skin coverage of >94% and many interconnected ligaments within its porous interior. This extraordinary configuration gives rise to superior in-plane electrical conductivity despite its low density. In comparison to state-of-the-art materials for electromagnetic interference shielding, this porous graphene film is among the best performing materials with a specific shielding effectiveness of >550 dB cm³ g⁻¹ and absolute effectiveness of >220 000 dB cm² g⁻¹.


Item Type:Article
Related URLs:
URLURL TypeDescription
https://doi.org/10.1002/admi.202101938DOIArticle
ORCID:
AuthorORCID
Tay, Roland Yingjie0000-0002-3341-0984
Li, Hongling0000-0002-2292-1949
Ng, Zhi Kai0000-0002-7740-8878
Tsang, Siu Hon0000-0003-4277-6539
Gao, Wei0000-0002-8503-4562
Teo, Edwin Hang Tong0000-0003-0528-1764
Additional Information:© 2022 Wiley-VCH. Issue Online: 23 February 2022; Version of Record online: 17 January 2022; Manuscript revised: 24 November 2021; Manuscript received: 09 October 2021. R.Y.T. and H.L. contributed equally to this work. R.Y.T. gratefully acknowledges the financial support under the College of Engineering (CoE) International Postdoctoral Fellowship (IPF), which is jointly provided by the Ministry of Education, Singapore and Nanyang Technological University, Singapore. Data Availability Statement. The data that support the findings of this study are available from the corresponding author upon reasonable request. The authors declare no conflict of interest.
Funders:
Funding AgencyGrant Number
Ministry of Education (Singapore)UNSPECIFIED
Nanyang Technological UniversityUNSPECIFIED
Subject Keywords:chemical vapor deposition; electromagnetic interference shielding; lightweight materials; porous graphene; redox cycling
Issue or Number:6
DOI:10.1002/admi.202101938
Record Number:CaltechAUTHORS:20220202-544220000
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:20220202-544220000
Official Citation:Tay, R. Y., Li, H., Ng, Z. K., Tsang, S. H., Gao, W., Teo, E. H. T., 3D Porous Graphene Films with Large-Area In-Plane Exterior Skins. Adv. Mater. Interfaces 2022, 9, 2101938. https://doi.org/10.1002/admi.202101938
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:113230
Collection:CaltechAUTHORS
Deposited By: George Porter
Deposited On:02 Feb 2022 23:53
Last Modified:11 Mar 2022 21:01

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