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Azidation of silicon(111) surfaces

Cao, Peigen and Xu, Ke and Heath, James R. (2008) Azidation of silicon(111) surfaces. Journal of the American Chemical Society, 130 (45). pp. 14910-14911. ISSN 0002-7863. doi:10.1021/ja804448p.

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A two-step chlorination/azidation process was reported to prepare azide-modified silicon(111) surfaces. XPS and IR analyses show the covalent bonding of azide with silicon. In combination with scanning tunneling microscopy and spectroscopy analyses, different kinetic rates, azide coverages, and surface-area distributions were derived depending on the azidation solvent.

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Heath, James R.0000-0001-5356-4385
Additional Information:© 2008 American Chemical Society. Received June 11, 2008. We acknowledge the Beckman Institute for the use of both XPS and FTIR instruments as well as the NSF (NSF-CCF-05204490) and the MARCO Center for Advanced Materials and Devices for funding. We thank Bolin Lin for helpful discussions on the choice of reaction solvent, Heather Agnew for IR suggestions, and Dr. Lidong Qin for graphics assistance.
Funding AgencyGrant Number
Microelectronics Advanced Research Corporation (MARCO)UNSPECIFIED
Subject Keywords:scanning-tunneling-microscopy; Si(111) surfaces; chemical-stability; alkyl monolayers; click chemistry; chlorination/alkylation process; terminated monolayers; unsaturated grignards; crystalline Si(111); electrode surfaces
Issue or Number:45
Record Number:CaltechAUTHORS:CAOjacs08
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Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:13674
Deposited By: Tony Diaz
Deposited On:06 Jul 2009 22:52
Last Modified:08 Nov 2021 22:39

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