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PlasMOStor: A metal-oxide-Si field effect plasmonic modulator

Dionne, Jennifer A. and Diest, Kenneth and Sweatlock, Luke A. and Atwater, Harry A. (2009) PlasMOStor: A metal-oxide-Si field effect plasmonic modulator. Nano Letters, 9 (2). pp. 897-902. ISSN 1530-6984. http://resolver.caltech.edu/CaltechAUTHORS:20090702-093628666

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Abstract

Realization of chip-based all-optical and optoelectronic computational networks will require ultracompact Si-compatible modulators, ideally comprising dimensions, materials, and functionality similar to electronic complementary metal−oxide−semiconductor (CMOS) components. Here we demonstrate such a modulator, based on field-effect modulation of plasmon waveguide modes in a MOS geometry. Near-infrared transmission between an optical source and drain is controlled by a gate voltage that drives the MOS into accumulation. Using the gate oxide as an optical channel, electro-optic modulation is achieved in device volumes of half of a cubic wavelength with femtojoule switching energies and the potential for gigahertz modulation frequencies.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1021/nl803868kDOIArticle
http://pubs.acs.org/doi/full/10.1021/nl803868kPublisherArticle
ORCID:
AuthorORCID
Atwater, Harry A.0000-0001-9435-0201
Additional Information:© 2009 American Chemical Society. Received December 22, 2008; Revised Manuscript Received January 5, 2009. This research was supported by the AFOSR under Grants FA9550-06-1-0480 and FA9550-04-1-0434. We also acknowledge use of facilities of the Center for Science and Engineering of Materials and of the NSF MRSEC. We thank G. deRose, M. Kelzenberg, C. Hofmann, H. Lezec, D. Pacifici, O. Painter, A. Polman, and E. Verhagen for engaging discussions and technical assistance. Special thanks are given to R. Briggs for assistance with membrane fabrication and R. Walters for data collection software and assistance with infrared optical testing. J.A.D. acknowledges support from the NSF and an NDSEG fellowship administered by the Army Research Office.
Group:Kavli Nanoscience Institute
Funders:
Funding AgencyGrant Number
Air Force Office of Scientific Research (AFOSR)FA9550-06-1-0480
Air Force Office of Scientific Research (AFOSR)FA9550-04-1-0434
NSFUNSPECIFIED
Army Research Office (ARO)UNSPECIFIED
Issue or Number:2
Record Number:CaltechAUTHORS:20090702-093628666
Persistent URL:http://resolver.caltech.edu/CaltechAUTHORS:20090702-093628666
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:14485
Collection:CaltechAUTHORS
Deposited By: Tony Diaz
Deposited On:12 Aug 2009 17:42
Last Modified:27 Sep 2017 23:59

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