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Alumina etch masks for fabrication of high-aspect-ratio silicon micropillars and nanopillars

Henry, M. D. and Walavalkar, S. and Homyk, A. and Scherer, A. (2009) Alumina etch masks for fabrication of high-aspect-ratio silicon micropillars and nanopillars. Nanotechnology, 20 (25). p. 255305. ISSN 0957-4484. http://resolver.caltech.edu/CaltechAUTHORS:20090831-074104743

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Abstract

We introduce using sputtered aluminum oxide (alumina) as a resilient etch mask for fluorinated silicon reactive ion etches. Achieving selectivity of 5000:1 for cryogenic silicon etching and 68:1 for SF_6/C_4F_8 silicon etching, we employ this mask for fabrication of high-aspect-ratio silicon micropillars and nanopillars. Nanopillars with diameters ranging from below 50 nm up to several hundred nanometers are etched to heights greater than 2 µm. Micropillars of 5, 10, 20, and 50 µm diameters are etched to heights of over 150 µm with aspect ratios greater than 25. Processing and characterization of the sputtered alumina is also discussed.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1088/0957-4484/20/25/255305DOIUNSPECIFIED
http://www.iop.org/EJ/abstract/0957-4484/20/25/255305/PublisherUNSPECIFIED
ORCID:
AuthorORCID
Henry, M. D.0000-0002-5201-0644
Walavalkar, S.0000-0002-7628-9600
Additional Information:© 2009 IOP Publishing Ltd. Received 6 April 2009, in final form 7 April 2009. Published 2 June 2009. David Henry gratefully acknowledges and thanks the Hertz Foundation for their support. This material is based upon work supported by National Science Foundation under the DMR- 012096 and ECS-0622228 award grants.
Group:Kavli Nanoscience Institute
Funders:
Funding AgencyGrant Number
Hertz FoundationUNSPECIFIED
NSFDMR-012096
NSFECS-0622228
Issue or Number:25
Record Number:CaltechAUTHORS:20090831-074104743
Persistent URL:http://resolver.caltech.edu/CaltechAUTHORS:20090831-074104743
Official Citation:Alumina etch masks for fabrication of high-aspect-ratio silicon micropillars and nanopillars M D Henry, S Walavalkar, A Homyk and A Scherer 2009 Nanotechnology 20 255305 (4pp) doi: 10.1088/0957-4484/20/25/255305
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:15474
Collection:CaltechAUTHORS
Deposited By: Ruth Sustaita
Deposited On:10 Sep 2009 15:47
Last Modified:23 Feb 2018 22:30

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