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Improved red-response in thin film a-Si:H solar cells with soft-imprinted plasmonic back reflectors

Ferry, Vivian E. and Verschuuren, Marc A. and Li, Hongbo B. T. and Schropp, Ruud E. I. and Atwater, Harry A. and Polman, Albert (2009) Improved red-response in thin film a-Si:H solar cells with soft-imprinted plasmonic back reflectors. Applied Physics Letters, 95 (18). Art. No. 183503 . ISSN 0003-6951. doi:10.1063/1.3256187. https://resolver.caltech.edu/CaltechAUTHORS:20091209-145455946

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Abstract

The impact of controlled nanopatterning on the Ag back contact of an n-i-p a-Si:H solar cell was investigated experimentally and through electromagnetic simulation. Compared to a similar reference cell with a flat back contact, we demonstrate an efficiency increase from 4.5% to 6.2%, with a 26% increase in short circuit current density. Spectral response measurements show the majority of the improvement between 600 and 800 nm, with no reduction in photocurrent at wavelengths shorter than 600 nm. Optimization of the pattern aspect ratio using electromagnetic simulation predicts absorption enhancements over 50% at 660 nm.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1063/1.3256187 DOIArticle
http://link.aip.org/link/?APPLAB/95/183503/1PublisherArticle
ORCID:
AuthorORCID
Schropp, Ruud E. I.0000-0003-4175-2658
Atwater, Harry A.0000-0001-9435-0201
Polman, Albert0000-0002-0685-3886
Additional Information:© 2009 American Institute of Physics. Received 4 September 2009; accepted 6 October 2009; published online 3 November 2009. We gratefully acknowledge H. Zeijlemaker for FIB assistance and C.H.M. van der Werf for solar cell deposition. The Caltech portion of this work was supported by the Department of Energy under Contract Number DE-FG02- 07ER46405. Work at AMOLF is part of the research program of FOM which is financially supported by NWO. This work is part of the Global Climate and Energy Project GCEP. This work is also a part of NANONED, a technology program of the Dutch Ministry of Economic Affairs.
Funders:
Funding AgencyGrant Number
Department of Energy (DOE)DE-FG02-07ER46405
Nederlandse Organisatie voor Wetenschappelijk Onderzoek (NWO)UNSPECIFIED
Global Climate and Energy Project (GCEP)UNSPECIFIED
NANONEDUNSPECIFIED
Ministry of Economic Affairs (Netherlands)UNSPECIFIED
Subject Keywords:amorphous semiconductors; current density; elemental semiconductors; nanopatterning; photoconductivity; plasmonics; silicon; silver; soft lithography; solar cells
Issue or Number:18
Classification Code:PACS: 81.16.Rf; 73.50.Pz
DOI:10.1063/1.3256187
Record Number:CaltechAUTHORS:20091209-145455946
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:20091209-145455946
Official Citation:Improved red-response in thin film a-Si:H solar cells with soft-imprinted plasmonic back reflectors Vivian E. Ferry, Marc A. Verschuuren, Hongbo B. T. Li, Ruud E. I. Schropp, Harry A. Atwater, and Albert Polman, Appl. Phys. Lett. 95, 183503 (2009), DOI:10.1063/1.3256187
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:16933
Collection:CaltechAUTHORS
Deposited By: Tony Diaz
Deposited On:04 Jan 2010 23:48
Last Modified:08 Nov 2021 23:31

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